靶材用高纯铪锭的金相制样方法
Sample Preparation Methods of Metallographic Examination for Hafnium Sputtering Target
摘 要
对比不同的抛光方法, 选择出针对靶材用高纯铪锭较为有效的机械加化学抛光方法, 并通过侵蚀来验证效果。结果表明: 采用混合化学抛光液(HF+HNO3+H2O+OPS+H2O2), 并施以较小的压力, 可将靶材用高纯铪的显微组织清晰地显示出来, 为后期显微组织分析提供了条件。
靶材
显微组织
金相制样
hafnium
target
microstructure
sampling for metallographic examination
Abstract
The more effective method for mechanical and chemical polishing was chose through the comparison of different polishing methods for hafnium sputtering target, then the effect was validated by erosion. The results showed that polishing with the solution (HF+HNO3+H2O+OPS+H2O2) and the less pressure was the better method of preparation for metallographic examination for hafnium. And it could provide condition for microstructure analysis.
中图分类号 TG146.4+1 TG115.21+1.2
所属栏目 试验技术与方法
基金项目
收稿日期 2014/2/26
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备注刘淑凤(1981-),女,工程师,硕士。
引用该论文: LIU Shu-feng,XIA Wen,ZHANG Li-min. Sample Preparation Methods of Metallographic Examination for Hafnium Sputtering Target[J]. Physical Testing and Chemical Analysis part A:Physical Testing, 2014, 50(9): 655～657
刘淑凤,夏雯,张丽民. 靶材用高纯铪锭的金相制样方法[J]. 理化检验－物理分册, 2014, 50(9): 655～657
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