利用扫描电镜(SEM)对铝合金6061在低浓度硫酸电解液中硬质阳极氧化膜的生长方式进行了研究。结果表明, 氧化初期氧化膜在基体表面上呈点状生长, 随着硬质阳极氧化反应的进行, 点状氧化膜长大并沿基体表面逐渐铺展, 同时在基体表面未氧化区域不断产生新的点状氧化膜。氧化膜以此种方式不断生长, 直到基体表面被氧化膜覆盖为止。在此之后氧化膜生长与在传统硫酸浓度中的生长方式几乎相同, 膜层厚度逐渐增加。在相同氧化时间和温度条件下, 低硫酸浓度硬质阳极氧化膜的硬度和厚度都高于传统硫酸浓度的氧化膜。

The growth pattern of hard anodic film on Al alloy 6061 in low concentration H2SO4 was studied by SEM. The results showed that the hard anodic oxide film was point-like growth on the surface of substrate at first. As the reaction progressed, the point-like oxide film grew up and spread out on the surface of substrate. At the same time, some new point-like oxide film grew on the non-oxidized surface area of substrate. In this way, oxide film grew up gradually until all the surface of substrate was covered with oxide film. After that the growth pattern of hard anodic film was almost the same as the traditional pattern. Under the same oxidation time and temperature conditions, the hardness and thickness of the oxide film in low concentration H2SO4 were higher than those of the traditional ones.