微量镓对精铝电化学腐蚀性能的影响
Effects of Trace Ga Content on Electrochemical Corrosion Resistance of Pure Al
摘 要
采用电化学测试法研究了微量镓(0.02%~0.06%Ga, 质量分数, 下同)的添加对4N精铝在5% NaCl溶液中的耐蚀性能。结果表明, 随着Ga含量的增加, 精铝的开路电位和点蚀电位朝着负方向移动, 腐蚀速率和点蚀发生系数增大; 电化学阻抗谱结果表明, 随着Ga含量的增加, 精铝的氧化膜电阻减小, 材料耐蚀性降低; 当Ga含量低于0.03%时, Ga对精铝的耐蚀性的影响较小。因此, 精铝中的Ga含量应控制在0.03%以下。
极化曲线
阻抗测试
点蚀
Al-Ga alloy
polarization curve
EIS test
pitting corrosion
Abstract
The effect of trace amount Ga (0.02% to 0.06%) on the corrosion behavior of pure Al (99.99%, 4N) in NaCl solution was investigated by potentiodynamic polarization technique and EIS. The results showed that the open circuit corrosion potential and pitting potential of Al shifted to active (negative) direction with the increase of Ga content, while the corrosion rate and pitting occurrence factor increased. From EIS test, the calculated results showed that the resitivity of oxide film on pure Al decreased with the increase of Ga content. The effect of Ga on the degradation of corrosion resistance was rather small when the Ga content was below 0.03%.The Ga content should be kept less than 0.03% in the pure Al.
中图分类号 TG174.43
所属栏目 试验研究
基金项目
收稿日期 2010/5/28
修改稿日期 2010/12/6
网络出版日期
作者单位点击查看
联系人作者林金平(jplinus@126.com)
引用该论文: LIN Jin-ping,WANG Jun,ZHAO Hong-sheng. Effects of Trace Ga Content on Electrochemical Corrosion Resistance of Pure Al[J]. Corrosion & Protection, 2011, 32(6): 455
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参考文献
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【2】Seiichi Toriyama, Chiaki Shibuta, Takehiko Mae, et al. Effect of gallium content on corrosion resistance of pure aluminum[J]. Journal of Japan Institute of Light Metals, 1998, 48(3):113-117.
【3】Osami Seri. Fundamental understanding of potential-pH diagram and polarization curve for aluminum and its alloys[J]. Journal of Japan Institute of Light Metals, 2007, 57(8):371-380.
【4】Flamini D O, Cunci L, Saidman S B. Electrochemical characterisation of gallium-aluminum amalgams[J]. Materials Chemistry and Physics, 2008, 108:33-38.
【5】许刚, 曹楚南, 林海潮, 等. 纯铝在NaCl溶液中活化溶解时电化学行为分析[J]. 腐蚀科学与防护技术, 1998, 10(6): 321-326.
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