银膜厚度对低辐射玻璃光学性能的影响
Effects of Ag Film Thickness on Optical Properties of Low-Emissivity Glass
摘 要
利用TFCalc软件模拟了银膜和TiO2膜厚度对TiO2/Ag/Ti/TiO2膜系光学性能的影响, 根据模拟结果利用电子束蒸发方法在玻璃衬底上制备了不同银膜厚度的TiO2/Ag/Ti/TiO2低辐射薄膜, 并对银膜的连续性及其低辐射玻璃的透射率进行了研究。结果表明: 银膜形成连续薄膜的临界厚度约为15 nm, 在该临界厚度下制备低辐射玻璃的可见光透射率可达81%, 且W70接近330 nm, 当银膜厚度为20 nm时不能获得高的可见光透射率。
连续性
银膜
光学性能
low-emissivity glass
continuity
Ag film
optical property
Abstract
Effect of Ag film and TiO2 film thicknesses on the optical properties of TiO2/Ag/Ti/TiO2 film system were simulated by using TFCalc software, and TiO2/Ag/Ti/TiO 2 low-emissivity films with different Ag film thicknesses were prepared by electron beam (E-beam) evaporation method according to simulated results. The results show that the critical thickness of Ag film to form a continuous film was about 15 nm, and the visible light transmittance of low-emissivity glass with the critical thickness was 81% and W70 was closed to 330 nm, while the high visible light transmittance could not obtained when the films thickness was 20 nm.
中图分类号 O484.4
所属栏目 新材料新工艺
基金项目 教育部新世纪人才项目(NCET-11-0127); 湖南省重大科技攻关项目(2011GK4050)
收稿日期 2012/3/8
修改稿日期 2012/11/1
网络出版日期
作者单位点击查看
备注徐兴红(1983-), 女, 山东临沂人, 硕士研究生。
引用该论文: XU Xing-hong,ZHOU Ling-ping,PENG Kun,ZHU Jia-jun,LI De-yi,LI Shao-lu. Effects of Ag Film Thickness on Optical Properties of Low-Emissivity Glass[J]. Materials for mechancial engineering, 2013, 37(3): 49～52
徐兴红,周灵平,彭坤,朱家俊,李德意,李绍禄. 银膜厚度对低辐射玻璃光学性能的影响[J]. 机械工程材料, 2013, 37(3): 49～52
被引情况:
【1】高晓明,孙嘉奕,胡明,翁立军,伏彦龙,杨军,谭洪根,张良俊, "低温沉积银和银铜薄膜的耐原子氧性能",机械工程材料 37, 55-59(2013)
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参考文献
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【2】PARK S H, LEE K S, RADDY A S. Low emissivity Ag/Si/glass thin films deposited by sputtering［J］.Solid State Sciences,2011,13(11):1984-1988.
【3】CHIBA K, TAKAHASHI T, KAGEYAMA T, et al. Low-emissivity coating of amorphous diamond-like carbon/Ag-alloy multilayer on glass［J］.Applied Surface Science,2005,246(1/3):48-51.
【4】SZCZYRBOWSKI J, BRAUER G, RUSKE M, et al. New low emissivity coating based on TwinMag sputtered TiO2 and Si3N4 layers［J］. Thin Solid Films, 1999, 351(1/2):254-259.
【5】MACLEOD H A. Thin-film optical filters［M］.UK: Institute of Physics Publishing,2001:80-428.
【6】LAFFERTY J M. Foundations of vacuum science and technology［M］. New York: John Wiley & Sons Inc,1998:72-75.
【7】李景明, 蔡珣, 茅及放. TiO2/Ag/TiO2纳米多层膜的研究［J］.机械工程材料,2004,28(2):34-37.
【8】王振国. 金属电介质复合纳米多层膜的结构与光学性能［D］.上海: 上海交通大学,2006:90-93.
【9】MOHELNIKOVA J. Materials for reflective coatings of window glass applications［J］. Construction and Building Materials, 2009, 23(5):1993-1998.
【10】KATO K, OMOTO H, TOMIOKA T, et al. Visible and near infrared light absorbance of Ag thin films deposited on ZnO under layers by magnetron sputtering［J］. Solar Energy Materials & Solar Cells, 2011, 95(8):2352-2356.
【11】LEE J H, LEE S H, YOO K L, et al. Deposition of multi-period low-emissivity filters for display application by RF magnetron sputtering［J］. Surface and Coatings Technology, 2002,158/159:477-481.
【12】LEFTHERIOTIS G, YIANOULIS P, PATRIKIOS D. Deposition and optical properties of optimized ZnS/Ag/ZnS thin films for energy saving applications［J］.Thin Solid Films,1997,306:92-99.
【13】AL-KUHAILI M F, AL-ASWAD A H, DURRANI S M A, et al. Transparent heat mirrors based on tungsten oxide-silver multilayer structures［J］.Solar Energy,2009,83(9):1571-1577.
【14】CHO S H, LEE S, KU D Y , et al. Growth behavior and optical properties of metal-nanoparticle dispersed dielectric thin films formed by alternating sputtering［J］.Thin Solid Films,2004,447/448:68-73.
【15】XU Shi , EVANS B L, FLYNN D I, et al. The study of island growth of ion beam sputtered metal films by digital image processing［J］.Thin Solid Films, 1994, 238(1): 54-61.
【16】刘海鹰,刁训刚,杨盟,等.低红外发射率TiO2/Ag/TiO2纳米多层膜研究［J］.红外,2005(10):1-6.
【17】CAMPBELL C T. Ultrathin metal films and particles on oxide surfaces: structural, electronic and chemisorptive properties［J］.Surface Science Reports,1997,27(1/3):1-111.
【18】范平, 伍瑞峰, 赖国燕. 连续金属薄膜的电阻率研究［J］. 真空科学与技术学报,1999,19(6):445-451.
【19】胡小草, 刁训刚, 郝雷. 大面积柔性基底TiO2/Ag/Ti/TiO2多层膜的制备及其光电和红外发射特性［J］.稀有金属,2008,32(3):300-305.
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