沉积温度和氩气压力对钛薄膜物相结构和性能的影响
Effects of Deposition Temperature and Ar Pressure on Phase Structure and Properties of Ti Films
摘 要
采用多弧离子镀方法在低温(166 K)、室温(300 K)以及不同氩气压力(0.2 ~0.8 Pa)条件下沉积钛薄膜, 通过X射线衍射仪、原子力显微镜、显微硬度计和划痕试验机等对薄膜的物相结构和性能进行了研究。结果表明: 不同工艺条件下沉积的钛薄膜均为密排六方纳米晶ω-Ti和α-Ti的两相复合相结构; 在低温、低氩气压条件下沉积的钛薄膜具有较高含量的硬脆ω相, 因而具有较高的显微硬度, 同时还表现出良好的膜基结合性能, 比较适宜用作固体润滑薄膜与钢基体间的过渡层, 以改善其膜基结合性能和承载能力。
钛薄膜
物相结构
性能
low temperature deposition
Ti films
phase structure
property
Abstract
Ti films were deposited at low temperature (166 K) and room temperature (300 K) under different Ar pressures of 0.2-0.8 Pa by arc ion plating (AIP). The phase structure and properties of the Ti films were studied using X-ray diffraction (XRD), atomic force microscope (AFM), microhardness tester and scratch tester. The results show that the Ti films deposited at various deposition conditions had a two-phase nanocomposite structure of hexagonal closed-packed (hcp) ω-Ti and α-Ti phases, and showed an increase in the relative content of ω phase with decreasing deposition temperature and Ar pressure. Thus the Ti films, deposited at lower temperature and Ar pressure, presented a higher microhardness because the ω phase is a hard brittle phase, and a better adhesion with steel substrate. Therefore, the Ti films deposited at lower temperature and Ar pressure were feasible for interlayers between solid lubricating films and steel substrates to improve their adhesion and load carrying capacity.
中图分类号 TB43
所属栏目 新材料新工艺
基金项目 国家自然科学基金资助项目(50301015, 21173243)
收稿日期 2012/9/17
修改稿日期 2013/6/21
网络出版日期
作者单位点击查看
备注高晓明(1978-), 男, 甘肃天水人, 副研究员, 博士。
引用该论文: GAO Xiao-ming,SUN Jia-yi,HU Ming,WENG Li-jun,FU Yan-long,YANG Jun,TAN Hong-gen. Effects of Deposition Temperature and Ar Pressure on Phase Structure and Properties of Ti Films[J]. Materials for mechancial engineering, 2013, 37(10): 44～49
高晓明,孙嘉奕,胡明,翁立军,伏彦龙,杨军,谭洪根. 沉积温度和氩气压力对钛薄膜物相结构和性能的影响[J]. 机械工程材料, 2013, 37(10): 44～49
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【2】唐伟忠. 薄膜材料制备原理、技术及应用[M].北京: 冶金工业出版社, 2003.
【3】ROBERTS E W, TODD M J. Space and vacuum tribology[J].Wear, 1990, 136: 157-167.
【4】BRISCOE H M. Why space tribology[J].Tribology International, 1990, 23: 67-74.
【5】RENEVIER N M, FOX U V C, TEER D G, et al. Coating characteristics and tribological properties of sputter-deposited MoS2/metal composite coatings deposited by closed field unbalanced magnetron sputter ion plating[J].Surface and Coatings Technology, 2000, 127: 24-37.
【6】TSAI P C, HWANG Y F, CHIANG J Y, et al. The effects of deposition parameters on the structure and properties of titanium-containing DLC films synthesized by cathodic arc plasma evaporation[J].Surface and Coatings Technology, 2008, 202: 5350-5355.
【7】DELLACORTE C, PEPPER S V, HONECY F S. Tribological properties of Ag/Ti films on Al2O3 ceramic substrates[J].Surface and Coatings Technology, 1992, 52: 31-37.
【8】GERTH J, WIKLUND U. The influence of metallic interlayers on the adhesion of PVD TiN coatings on high-speed steel[J].Wear, 2008, 264: 885-892.
【9】ZHANG L, SHI L Q, HE Z J, et al. Deposition of dense and smooth Ti films using ECR plasma-assisted magnetron sputtering[J].Surface and Coatings Technology, 2009, 203: 3356-3360.
【10】KAWANABE T, PARK J, NAOE M. Control of morphology and crystallinity of chromium sputtered film[J].Materials Science and Engineering: A, 1991, 134: 1305-1308.
【11】BENDAVID A, MARTIN P J, SMITH G B, et al. The mechanical and structural properties of Ti films prepared by filtered arc deposition[J].Vacuum, 1996, 47: 1179-1188.
【12】高晓明, 孙嘉奕, 胡明, 等.低温沉积Cu膜的晶体结构及摩擦磨损性能的初步研究[J].摩擦学学报, 2007, 27(4): 308-312.
【13】高晓明, 孙嘉奕, 胡明, 等.沉积温度及膜厚对离子镀银膜结构及摩擦学性能的影响[J].机械工程材料, 2007, 31(7): 11-14.
【14】常辉. Ti-B19合金固态相变动力学及其组织演变规律[D].西安: 西北工业大学, 2006.
【15】李士凯, 余魏, 廖志谦, 等.ω相对Ti10V2Fe3Al合金性能的影响[J].中国有色金属学报, 2010(增1): 387-392.
【16】刘以波, 徐锋, 姚雷, 等.TA2工业纯钛连续冷却过程中β→α相变的原位观察[J].机械工程材料, 2011, 35(1): 26-32.
【17】朱知寿, 杨照苏, 顾家琳, 等.钛的织构与力学性能各向异性关系研究[J].机械工程材料, 1994, 18(2): 23-25.
【18】HOSHI Y, SUZUKI E, SHIMIZU H. Control of crystal orientation of Ti thin films by sputtering[J].Electrochimica Acta, 1999, 44: 3945-3952.
【19】HARADA T, OHKOSHI H. Growth and structure of Ti films deposited on chemically polished MgO (100) substrates[J].Journal of Crystal Growth, 1997, 171: 433-441.
【20】CHAWLA V, JAYAGANTHAN R, CHAWLA A K, et al. Materials morphological study of magnetron sputtered Ti thin films on silicon substrate[J].Chemistry and Physics, 2008, 111: 414-418.
【21】SAVALONI H, TAHERIZADEH A, ZENDEHNAM A. Residual stress and structural characteristics in Ti and Cu sputtered films on glass substrates at different substrate temperatures and film thickness[J].Physica: B, 2004, 349: 44–55.
【22】BUNSHAH R F, JUNTZ R S. Influence of condensation temperature on microstructure and tensile properties of titanium sheet produced by high-rate physical vapor deposition process[J].Metall Trans, 1973, 4(1): 21-26.
【23】YUE L P, YAO W G, QI Z Z, et al. Structure of nanometer-size crystalline Ti film[J].Nanostructured Materials, 1994, 4(4): 451-456.
【24】HUANG J H, CHANG K H, YU G P. Synthesis and characterization of nanocrystalline ZrNxOy thin films on Si by ion plating[J].Surface and Coatings Technology, 2007, 201: 6404-6413.
【25】WENG L J, SUN J Y, HU M, et al. Structure and tribological properties of Ag films deposited at low temperature[J].Vacuum, 2007, 81: 997-1002.
【26】MUSI J, VLCEK J. Magnetron sputtering of hard nanocomposite coatings and their properties[J].Surface and Coatings Technology, 2001, 142/144: 557-566.
【27】KUSAKA K, TANIGUCHI D, HANABUSA T, et al. Effect of sputtering gas pressure and nitrogen concentration on crystal orientation and residual stress in sputtered AlN films[J].Vacuum, 2002, 66: 441-446.
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