低温沉积银和银铜薄膜的耐原子氧性能
Atomic Oxygen Resistant Behavior of Ag and Ag-Cu Films Deposited at Low Temperature
摘 要
采用多弧离子镀方法在低温(173 K)下沉积了银和银铜薄膜, 通过地面原子氧模拟试验系统考察了薄膜的耐原子氧性能, 通过X射线衍射仪(XRD)和原子力显微镜(AFM)对薄膜的结构和耐原子氧性能进行了分析, 并与室温下沉积的银薄膜进行了比较。结果表明: 低温沉积和铜元素合金化, 可减小银薄膜的晶粒尺寸, 并提高其结构致密性; 低温沉积的银铜薄膜表现出细密的结构, 这有利于抑制原子氧对薄膜的氧化, 从而使其比室温及低温下沉积的银薄膜具有更好的耐原子氧性能。
银铜薄膜
耐原子氧性能
low temperature deposition
Ag-Cu film
AO resistant behavior
Abstract
Ag and Ag-Cu films were deposited at low temperature (173 K) by arc ion plating (AIP). Atomic oxygen (AO) irradiation experiments were conducted using a ground AO simulation facility. The structure and AO resistant behavior of the films were investigated by X-ray diffraction (XRD) and atomic force microscope (AFM) and compared with Ag film deposited at room temperature. The results show that crystallite size of Ag film was reduced by low temperature deposition and alloying with Cu, and its structure became more densified. So the Ag-Cu film deposited at low temperature had a dense structure beneficial for resisting oxidation of films by oxygen, and exhibited much better AO resistant behavior than that of the Ag film deposited at room temperature or at low temperature after the AO irradiation.
中图分类号 TG146.3
所属栏目 材料性能及其应用
基金项目 国家自然科学基金资助项目(50301015, 51227804)
收稿日期 2012/9/29
修改稿日期 2013/6/27
网络出版日期
作者单位点击查看
备注高晓明(1978-), 男, 甘肃天水人, 副研究员, 博士。
引用该论文: GAO Xiao-ming,SUN Jia-yi,HU Ming,WENG Li-jun,FU Yan-long,YANG Jun,TAN Hong-gen,ZHANG Liang-jun. Atomic Oxygen Resistant Behavior of Ag and Ag-Cu Films Deposited at Low Temperature[J]. Materials for mechancial engineering, 2013, 37(11): 55～59
高晓明,孙嘉奕,胡明,翁立军,伏彦龙,杨军,谭洪根,张良俊. 低温沉积银和银铜薄膜的耐原子氧性能[J]. 机械工程材料, 2013, 37(11): 55～59
被引情况:
【1】王会,徐晓,冯斌,王德苗, "磁控溅射银/铜双层膜的电性能和结合强度",机械工程材料 39, 65-67(2015)
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参考文献
【1】ROBERTS E W, TODD M J. Space and vacuum tribology[J].Wear, 1990, 136: 157-167.
【2】徐兴红, 周灵平, 彭坤, 等.银膜厚度对低辐射玻璃光学性能的影响[J].机械工程材料, 2013, 37(3): 49-52.
【3】ROOIJ A D. The oxidation of silver by atomic oxygen[J].ESA Journal, 1989, 13: 363-382.
【4】MOORE W M, CODELLA P J. Oxidation of silver films by atomic oxygen[J].J Phys Chem, 1988, 92: 4421-4426.
【5】MUSI J, VLEK J. Magnetron sputtering of hard nanocomposite coatings and their properties[J].Surface and Coatings Technology, 2001, 142/144: 557-566.
【6】KALE A, SEAL S, SOBCZAK N, et al. Effect of deposition temperature on the morphology, structure, surface chemistry and mechanical properties of magnetron sputtered Ti70-Al30 thin films on steel substrate[J].Surf Coat Technol, 2001, 141(2/3): 252-261.
【7】高晓明, 孙嘉奕, 胡明, 等.沉积温度及膜厚对离子镀银膜结构及摩擦学性能的影响[J].机械工程材料, 2007, 31(7): 11-14.
【8】孙晓军, 翁立军, 孙嘉奕, 等.模拟原子氧环境的真空摩擦试验装置[J].摩擦学学报, 2002, 22(6): 462-467.
【9】SHENG H W, WILDE G, MA E. The competing crystalline and amorphous solid solutions in the Ag–Cu system[J].Acta Materialia, 2002, 50: 475-488.
【10】WENG L J, SUN J Y, HU M, et al. Structure and tribological properties of Ag films deposited at low temperature[J].Vacuum, 2007, 81: 997-1002.
【11】HU M, GAO X M, SUN J Y, et al. Influence of deposition temperature and pressure on microstructure and tribological properties of arc ion plated Ag films[J].Chinese Journal of Mechanical Engineering, 2012, 25: 838-844.
【12】LAMBREGTS M J, FRANK S. Application of Vegard’s law to mixed cation sodalites: a simple method for determining the stoichiometry[J].Talanta, 2004, 62: 627-630.
【13】HUANG J H, CHANG K H, YU G P. Synthesis and characterization of nanocrystalline ZrNxOy thin films on Si by ion plating[J].Surface and Coatings Technology, 2007, 201: 6404-6413.
【14】REDDY M R. Review effect of low earth orbit atomic oxygen on spacecraft materials[J].Journal of Materials Science, 1995, 30: 281-307.
【15】吴子勤, 王兵.薄膜生长[M].北京: 科学出版社, 2001.
【2】徐兴红, 周灵平, 彭坤, 等.银膜厚度对低辐射玻璃光学性能的影响[J].机械工程材料, 2013, 37(3): 49-52.
【3】ROOIJ A D. The oxidation of silver by atomic oxygen[J].ESA Journal, 1989, 13: 363-382.
【4】MOORE W M, CODELLA P J. Oxidation of silver films by atomic oxygen[J].J Phys Chem, 1988, 92: 4421-4426.
【5】MUSI J, VLEK J. Magnetron sputtering of hard nanocomposite coatings and their properties[J].Surface and Coatings Technology, 2001, 142/144: 557-566.
【6】KALE A, SEAL S, SOBCZAK N, et al. Effect of deposition temperature on the morphology, structure, surface chemistry and mechanical properties of magnetron sputtered Ti70-Al30 thin films on steel substrate[J].Surf Coat Technol, 2001, 141(2/3): 252-261.
【7】高晓明, 孙嘉奕, 胡明, 等.沉积温度及膜厚对离子镀银膜结构及摩擦学性能的影响[J].机械工程材料, 2007, 31(7): 11-14.
【8】孙晓军, 翁立军, 孙嘉奕, 等.模拟原子氧环境的真空摩擦试验装置[J].摩擦学学报, 2002, 22(6): 462-467.
【9】SHENG H W, WILDE G, MA E. The competing crystalline and amorphous solid solutions in the Ag–Cu system[J].Acta Materialia, 2002, 50: 475-488.
【10】WENG L J, SUN J Y, HU M, et al. Structure and tribological properties of Ag films deposited at low temperature[J].Vacuum, 2007, 81: 997-1002.
【11】HU M, GAO X M, SUN J Y, et al. Influence of deposition temperature and pressure on microstructure and tribological properties of arc ion plated Ag films[J].Chinese Journal of Mechanical Engineering, 2012, 25: 838-844.
【12】LAMBREGTS M J, FRANK S. Application of Vegard’s law to mixed cation sodalites: a simple method for determining the stoichiometry[J].Talanta, 2004, 62: 627-630.
【13】HUANG J H, CHANG K H, YU G P. Synthesis and characterization of nanocrystalline ZrNxOy thin films on Si by ion plating[J].Surface and Coatings Technology, 2007, 201: 6404-6413.
【14】REDDY M R. Review effect of low earth orbit atomic oxygen on spacecraft materials[J].Journal of Materials Science, 1995, 30: 281-307.
【15】吴子勤, 王兵.薄膜生长[M].北京: 科学出版社, 2001.
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