衬底偏压对掺铬类石墨碳膜组织、性能及碳键结构的影响
Influences of Substrate Bias Voltage on Microstructure, Properties and Carbon Element′s Valence Bond Structure of Cr-doped Graphite-like Carbon Film
摘 要
采用非平衡磁控溅射离子镀技术在不同衬底偏压下沉积了掺铬类石墨非晶碳膜,研究了衬底偏压对其显微组织、硬度、内应力、结合强度和碳键结构的影响,着重分析了衬底偏压对碳膜硬度的影响机理。结果表明:随着衬底偏压增大,掺铬类石墨碳膜的显微组织先是趋于致密化,偏压过大时则会形成受损的凝絮状结构,而碳膜的硬度、内压应力和结合强度均先增后减;碳膜的硬度和内压应力在-90 V偏压下达到最大,分别为3 295 HV和1.133 GPa,此时的碳膜具有最致密的显微组织和最高含量的sp3碳组分;碳膜的结合强度则在-65 V偏压下达到最大,其临界载荷为53.8 N;掺铬类石墨碳膜硬度的变化与碳膜的碳键结构、内应力和显微组织的演变存在明显的相关性。
衬底偏压
碳键结构
硬度
amorphous carbon film
substrate bias voltage
carbon element′s valence bond structure
hardness
Abstract
Cr-doped graphite-like amorphous carbon films were deposited by unbalanced magnetron sputter ion plating technique at different substrate bias voltages. Influences of substrate bias voltage on microstructure, hardness, internal stress, bonding strength and carbon element′s valence bond structure of the films were investigated, and the influence mechanism of substrate bias voltage on hardness was analyzed emphatically. The results show that the microstructure of the films gradually became compact initially with the increase of substrate bias voltage, and then damaged flocculation structure comes into being as the bias voltage was too high. The hardness, internal compressive stress and bonding strength of the films increased first and then decreased with the increase of substrate bias voltage. The films deposited at -90 V possessed the highest hardness (3 295 HV) and internal compressive stress (1.133 GPa) as well as the finest microstructure and the most sp3 carbon content. The films deposited at -65 V showed the highest bonding strength (Lc=53.8 N). The changes of hardness of the Cr-doped graphite-like carbon films were closely related with the evolutions of carbon element′s valence bond structure, internal stress and microstructure of the films.
中图分类号 TB43 O484.5
所属栏目 新材料新工艺
基金项目 陕西省自然科学基金资助项目(2012JM6016);陕西省教育厅科研计划项目(2013JK0915);陕西理工学院人才启动项目(SLGQD1104);陕西理工学院科研计划项目(SLGKY11-02)
收稿日期 2013/8/24
修改稿日期 2014/8/5
网络出版日期
作者单位点击查看
备注张永宏(1967-),男,陕西白水人,副教授,博士。
引用该论文: ZHANG Yong-hong,YANG Li-wen,WANG Yu-mei,FANG Dong-ming. Influences of Substrate Bias Voltage on Microstructure, Properties and Carbon Element′s Valence Bond Structure of Cr-doped Graphite-like Carbon Film[J]. Materials for mechancial engineering, 2014, 38(11): 66～71
张永宏,杨丽雯,王玉梅,房东明. 衬底偏压对掺铬类石墨碳膜组织、性能及碳键结构的影响[J]. 机械工程材料, 2014, 38(11): 66～71
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参考文献
【1】任金伟,李红,邓涛略,等.类金刚石表面改性C/C复合材料的摩擦磨损性能［J］.机械工程材料,2012,36(12):40-44.
【2】YANG S, LI X, RENEVIER N M, et al. Tribological properties and wear mechanism of sputtered C/Cr coating［J］.Surface and Coatings Technology,2001,142/144:85-93.
【3】张永宏,蒋百灵,严少平.掺铬类石墨碳膜的显微组织和摩擦性能［J］.机械工程材料,2010,34(5):40-45.
【4】唐伟忠.薄膜材料制备原理、技术及应用［M］.第二版. 北京: 冶金工业出版社,2003:86-93.
【5】KELLY P J, ARNELL R D. Magnetron sputtering: a review of recent developments and applications［J］.Vacuum,2000,56:159-172.
【6】WINDOW B. Recent advances in sputter deposition［J］.Surface and Coatings Technology,1995,71:93-97.
【7】LAING K, HAMPSHIRE J, TEER D G, et al. The effect of ion current density on the adhesion and structure of coatings deposited by magnetron sputter ion plating［J］.Surface and Coatings Technology,1999,112:177-180.
【8】TEER D G. New solid lubricant coatings［J］.Wear,2001,251:1068-1074.
【9】CAMINO D, JONES A H S, MERCS D, et al. High performance sputtered carbon coatings for wear resistant applications［J］.Vacuum,1999,52:125-131.
【10】FIELD S K, JARRATT M, TEER D G. Tribological properties of graphite-like and diamond-like carbon coatings［J］.Tribology International,2004,37:949-956.
【11】MYUNG H S, PARK Y S, JUNG M J, et al. Synthesis and mechanical properties of amorphous carbon films by closed-field unbalanced magnetron sputtering［J］.Materials Letters,2004,58:1513-1516.
【12】PARK Y S, MYUNG H S, HAN J G, et al. Tribological properties of amorphous carbon thin films grown by magnetron sputtering method［J］.Surface and Coatings Technology,2004,180/181:218-221.
【13】YANG S, TEER D G. Investigation of sputtered carbon and carbon/chromium multi-layered coatings［J］.Surface and Coatings Technology,2000,131:412-416.
【14】PUCHI-CABRERA E S, BERRIOS J A, TEER D G. On the computation of the absolute hardness of thin solid films［J］.Surface and Coatings Technology,2002,157:185-196.
【15】FERRARI A C, RODIL S E, ROBERTSON J, et al. Is stress necessary to stabilise sp3 bonding in diamond-like carbon［J］.Diamond and Related Materials,2002,11:994-999.
【16】QI J, LUO J B, WANG K L, et al. Mechanical and tribological properties of diamond-like carbon films deposited by electron cyclotron resonance microwave plasma chemical vapor deposition［J］.Tribology Letters,2003,14(2):105-109.
【17】KOK Y N, HOVSEPIAN P E, HAASCH R, et al. Raman spectroscopy study of C/Cr coatings deposited by the combined steered cathodic ARC/unbalanced magnetron sputtering technique［J］.Surface and Coatings Technology,2005,200:1117-1122.
【18】TAY B K, SHI X, TAN H S, et al. Raman studies of tetrahedral amorphous carbon films deposited by filtered cathodic vacuum arc［J］.Surface and Coatings Technology,1998,105:155-158.
【19】GASSNER G, MAYRHOFER P H, MITTERER C, et al. Structure-property relations in Cr-C/a-C:H coatings deposited by reactive magnetron sputtering［J］.Surface and Coatings Technology,2005,200:1147-1150.
【20】FERRARI A C. Determination of bonding in diamond-like carbon by Raman spectroscopy［J］.Diamond and Related Materials,2002,11:1053-1061.
【21】ROBERTSON J. Diamond-like amorphous carbon［J］.Materials Science and Engineering,2002,37(4/6):129-281.
【22】ROBERTSON J. Mechanism of sp3 bond formation in the growth of diamond-like carbon［J］.Diamond and Related Materials,2005,14:942-948.
【23】LACERDA R G, MARQUES F C, FREIRE JR F L. The subimplantation model for diamond-like carbon films deposited by methane gas decomposition［J］.Diamond and Related Materials,1999,8:495-499.
【2】YANG S, LI X, RENEVIER N M, et al. Tribological properties and wear mechanism of sputtered C/Cr coating［J］.Surface and Coatings Technology,2001,142/144:85-93.
【3】张永宏,蒋百灵,严少平.掺铬类石墨碳膜的显微组织和摩擦性能［J］.机械工程材料,2010,34(5):40-45.
【4】唐伟忠.薄膜材料制备原理、技术及应用［M］.第二版. 北京: 冶金工业出版社,2003:86-93.
【5】KELLY P J, ARNELL R D. Magnetron sputtering: a review of recent developments and applications［J］.Vacuum,2000,56:159-172.
【6】WINDOW B. Recent advances in sputter deposition［J］.Surface and Coatings Technology,1995,71:93-97.
【7】LAING K, HAMPSHIRE J, TEER D G, et al. The effect of ion current density on the adhesion and structure of coatings deposited by magnetron sputter ion plating［J］.Surface and Coatings Technology,1999,112:177-180.
【8】TEER D G. New solid lubricant coatings［J］.Wear,2001,251:1068-1074.
【9】CAMINO D, JONES A H S, MERCS D, et al. High performance sputtered carbon coatings for wear resistant applications［J］.Vacuum,1999,52:125-131.
【10】FIELD S K, JARRATT M, TEER D G. Tribological properties of graphite-like and diamond-like carbon coatings［J］.Tribology International,2004,37:949-956.
【11】MYUNG H S, PARK Y S, JUNG M J, et al. Synthesis and mechanical properties of amorphous carbon films by closed-field unbalanced magnetron sputtering［J］.Materials Letters,2004,58:1513-1516.
【12】PARK Y S, MYUNG H S, HAN J G, et al. Tribological properties of amorphous carbon thin films grown by magnetron sputtering method［J］.Surface and Coatings Technology,2004,180/181:218-221.
【13】YANG S, TEER D G. Investigation of sputtered carbon and carbon/chromium multi-layered coatings［J］.Surface and Coatings Technology,2000,131:412-416.
【14】PUCHI-CABRERA E S, BERRIOS J A, TEER D G. On the computation of the absolute hardness of thin solid films［J］.Surface and Coatings Technology,2002,157:185-196.
【15】FERRARI A C, RODIL S E, ROBERTSON J, et al. Is stress necessary to stabilise sp3 bonding in diamond-like carbon［J］.Diamond and Related Materials,2002,11:994-999.
【16】QI J, LUO J B, WANG K L, et al. Mechanical and tribological properties of diamond-like carbon films deposited by electron cyclotron resonance microwave plasma chemical vapor deposition［J］.Tribology Letters,2003,14(2):105-109.
【17】KOK Y N, HOVSEPIAN P E, HAASCH R, et al. Raman spectroscopy study of C/Cr coatings deposited by the combined steered cathodic ARC/unbalanced magnetron sputtering technique［J］.Surface and Coatings Technology,2005,200:1117-1122.
【18】TAY B K, SHI X, TAN H S, et al. Raman studies of tetrahedral amorphous carbon films deposited by filtered cathodic vacuum arc［J］.Surface and Coatings Technology,1998,105:155-158.
【19】GASSNER G, MAYRHOFER P H, MITTERER C, et al. Structure-property relations in Cr-C/a-C:H coatings deposited by reactive magnetron sputtering［J］.Surface and Coatings Technology,2005,200:1147-1150.
【20】FERRARI A C. Determination of bonding in diamond-like carbon by Raman spectroscopy［J］.Diamond and Related Materials,2002,11:1053-1061.
【21】ROBERTSON J. Diamond-like amorphous carbon［J］.Materials Science and Engineering,2002,37(4/6):129-281.
【22】ROBERTSON J. Mechanism of sp3 bond formation in the growth of diamond-like carbon［J］.Diamond and Related Materials,2005,14:942-948.
【23】LACERDA R G, MARQUES F C, FREIRE JR F L. The subimplantation model for diamond-like carbon films deposited by methane gas decomposition［J］.Diamond and Related Materials,1999,8:495-499.
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