磁控共溅射制备锆-硅-氮复合薄膜的显微组织与性能
Microstructure and Properties of Zr-Si-N Composite Films Prepared by Reactive Magnetron Co-sputtering
摘 要
通过磁控共溅射方法制备了一系列不同硅含量的锆-硅-氮复合薄膜;采用能谱仪、X射线衍射仪、扫描电镜和微力学探针等对复合薄膜进行了表征;研究了薄膜中硅、锆原子比对复合薄膜的显微组织、高温抗氧化性能和力学性能的影响.结果表明:随着硅含量的增加,复合薄膜的ZrN(111)、(220)晶面衍射峰逐渐消失,呈现ZrN(200)择优取向；同时其性能逐渐提高,当硅、锆原子比为0.030时可获得最大硬度和最大弹性模量,分别为37.8 GPa和363 GPa;进一步增加硅含量,复合薄膜向非晶态转化,而薄膜的硬度和弹性模量迅速降低,抗氧化温度显著提高.
显微组织
抗氧化性能
力学性能
Zr-Si-N composite film
microstructure
oxidation resistance
mechanical property
Abstract
A series of Zr-Si-N composite films with different Si contents were prepared by reactive magnetron co-sputtering method.The films were characterized with EDS,XRD,SEM and nano-indentation.The effect of Si content on microstructure,oxidation resistance and mechanical properties of the Zr-Si-N films was studied.The results show that with the increase of Si content,ZrN(111) and ZrN(220) coystal face diffraction peaks of the composite dispeared gradually and ZrN(200) orientation preferred.The maximum hardness and elastic module of Zr-Si-N films are 37.8 GPa and 363 GPa when Si/Zr atomic rate was 0.030.With a further increase of Si content in the films,crystalline Zr-Si-N composite films turned into amorphous films and the mechanical properties decreased gradually.The oxidation resistance was obviously improved with the increase of Si content.
中图分类号 TG174.44 TG148
所属栏目 材料性能及其应用
基金项目 国家自然科学基金资助项目(50574044)
收稿日期 2007/9/21
修改稿日期 2008/5/6
网络出版日期
作者单位点击查看
备注董松涛(1982-),男,河南驻马店人,硕士研究生.
引用该论文: DONG Song-tao,YU Li-hua,DONG Shi-run,XU Jun-hua. Microstructure and Properties of Zr-Si-N Composite Films Prepared by Reactive Magnetron Co-sputtering[J]. Materials for mechancial engineering, 2008, 32(9): 54～58
董松涛,喻利花,董师润,许俊华. 磁控共溅射制备锆-硅-氮复合薄膜的显微组织与性能[J]. 机械工程材料, 2008, 32(9): 54～58
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【12】Steyer P,Pilloud D,Pierson J F,et al.Oxidation resistance improvement of arc-evaporated TiN hard coatings by silicon addition[J].Surf Coat Technol,2006,201:4158-4162.
【13】Veprek S,Veprek H,Maritza G J,et al.Different approaches to superhard coatings and nanocomposites[J].Thin Solid Films,2005,476(1):1-29.
【14】Veprek S,Reiprich S.A concept for the design of novel superhard coatings[J].Thin Solid Films,1995,268:64-71.
【15】Sandu C S,Benkahoul M,Sanjinés R,et al.Model for the evolution of Nb-Si-N thin films as a function of Si content relating the nanostructure to electrical and mechanical properties[J].Surface and Coatings Technology,2006,201(6):2897-2903.
【16】Hultman L,Bareo J,Flink A,et al.Interface structure in superhard TiN-SiN nanolaminates and nanocomposites:Film growth experiments and ab initio calculations[J].Phys Rev B,2007,75:1-6.
【17】孔 明,赵文济,乌晓燕,等.TiN/Si3N4纳米晶复合膜的微结构和强化机制[J].无机材料学报,2007,22(3):539-544.
【18】Nose M,Chiou W A,Zhou M,et al.Microstructure and mechanical properties of Zr-Si-N films prepared by rf-reactive sputtering[J].J Vac Sci Technol A,2002,20(3):823-828.
【19】Cahn J W.Hardening by spinodal decomposition[J].Acta Metall,1963,11:275-1282.
【20】Kato M,Mori T,Schwartz L H.Hardening by spinodal modulated structure[J].Acta Metall,1980,28(3):285-290.
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