氮流量比对直流反应磁控溅射制备氮化铬涂层组织和性能的影响
Effect of N2 Flow Rate on Structure and Property of CrN Coatings Deposited by DC Reactive Magnetron Sputtering
摘 要
采用直流磁控溅射法制备氮化铬涂层,研究了氮流量比对涂层相结构、表面形貌和硬度和涂层结合力的影响.结果表明:当氮流量比在30%~100%变化时,涂层主要由CrN相构成;随氮流量比增加,涂层晶粒形貌由三角锥转变为三角锥与球状共存,涂层变得致密,硬度得到提高;氮流量比对涂层结合力影响不大.
氮流量比
氮化铬涂层
DC magnetron sputtering
N2 flow rate
chromium nitride coating
Abstract
Chromium nitride(CrN)coating was deposited by DC reactive magnetron sputtering.The effect of N2 flow rate on microstructure,surface morphology,hardness and bonding force of the CrN coating was studied.The results show that when N2 flow rate changed from 30% to 100%,the coating was mainly composed of CrN phase.With the increase of N2 flow rate the grain shape of CrN coatings changed from pyramidal to the coexistence pyramidal and spheroidal topography,and the coatings became denser,which led to the improvement of the hardness.The effect of N2 flow rate on bonding force of the coating was weak.
中图分类号 TB3 TG14 TG17
所属栏目 试验研究
基金项目 国家科技支撑计划资助项目(2007BAE15B05)
收稿日期 2009/6/14
修改稿日期 2010/2/8
网络出版日期
作者单位点击查看
备注谈淑咏(1976-),女,江苏连云港人,博士研究生.
引用该论文: TAN Shu-yong,ZHANG Xu-hai,WU Xiang-jun,JIANG Jian-qing. Effect of N2 Flow Rate on Structure and Property of CrN Coatings Deposited by DC Reactive Magnetron Sputtering[J]. Materials for mechancial engineering, 2010, 34(7): 34～37
谈淑咏,张旭海,吴湘君,蒋建清. 氮流量比对直流反应磁控溅射制备氮化铬涂层组织和性能的影响[J]. 机械工程材料, 2010, 34(7): 34～37
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参考文献
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【2】CUNHA L,ANDRITSCHKY M,PISCHOW K,et al.Microstructure of CrN coatings produced by PVD techniques[J].Thin Solid Films,1993,355/356:465-471.
【3】GUNTER B,CHRISTOPH F,ERHARD B,et al.Development of chromium nitride coatings substituting titanium nitride[J].Surface and Coatings Technology,1996,86/87:184-191.
【4】NAM N D,KIM J G.Electrochemical behavior of CrN coated on 316L stainless steel in simulated cathodic environment of proton exchange membrane fuel cell[J].Japanese Journal of Applied Physics,2008,47(8):6887-6890.
【5】BUJAK J,WALKOWICZ J,KUSHINSKI J.Influence of the nitrogen pressure on the structure and properties of(Ti,Al)N filmings deposited by cathodic vacuum arc PVD process[J].Surface and Coatings Technology,2004,180/181:150-157.
【6】LI M S,WANG F H.Effects of nitrogen partial pressure and pulse bias voltage on(Ti,Al)N films by arc ion plating[J].Surface and Coatings Technology,2003,167(2/3):197-202.
【7】李戈扬,张俊秋,韩增虎,等.氮分压对CrNx涂层相结构与力学性能的影响[J].电子显微学报,2002,21(5):629-630.
【8】田俊红.磁控溅射制备CrNx涂层及其结构和性能研究[J].真空与低温,2007,13(3):159-162.
【9】SU C Y,PAN C T,LIOU T P.Investigation of the microstructure and characterizations of TiN/CrN nanomultilayer deposited by unbalanced magnetron sputter process[J].Surface and Coatings Technology,2008,203(5/7):657-660.
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