Effect of Annealing Temperatures on Structures and Optical Properties of RF Magnetron Sputtering SiC Films
摘 要
首先采用射频磁控溅射法在单晶Si(100)衬底上沉积制备了SiC薄膜,然后将所制备的薄膜试样分别在600, 800和1 000 ℃氩气氛中退火120 min;采用X射线衍射仪和红外吸收光谱仪分析了薄膜的结构随退火温度的变化, 采用荧光分光分度计研究了薄膜的发光性能随退火温度的变化。结果表明: 室温制备的SiC薄膜为非晶态, 经600 ℃退火后薄膜结晶, 且随着退火温度的升高, 薄膜的结晶程度越来越好, 并且部分SiC结构发生了由α-SiC到β-SiC的转变; 所制备的SiC薄膜在384 和408 nm处有两个发光峰, 且两峰的强度均随退火温度的升高逐渐变强, 其中384 nm处的峰源自于SiC的发光, 408 nm处的峰源自于碳簇的发光。
Abstract
First SiC films were prepared on Si(100) substrates by RF magnetron sputtering at room temperature, and then the SiC films were annealed at 600, 800 and 1 000 ℃ for 120 min in argon atmosphere. The structure of SiC films was studied with XRD and FTIR and the PL spectra of SiC films were measured by fluorescence spectrophotometer. The results show that the SiC films prepared at room temperature were amorphous and they became crystalline when being annealed at 600 ℃. The crystallinity of SiC films was improved and there was β-SiC formed with the increase of annealing temperature. There were two photoluminescence peaks at 384 and 408 nm, and the intensity of these two peaks increased with the increase of annealing temperature. The PL peak at 384 nm was due to the SiC particles while the PL peak at 408 nm was related to the carbon clusters.
中图分类号 TB43
所属栏目 试验与研究
基金项目 国家“973”计划资助项目(2008CB717802);安徽省自然科学基金资助项目(090414182);安徽省高校自然科学基金资助项目(KJ2009A091)
收稿日期 2010/4/26
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备注都 智(1987-),男,硕士研究生。
引用该论文: DU Zhi,LI He-qin,NIE Zhu-hua,CHU Han-qi,ZHU Jing-chao. Effect of Annealing Temperatures on Structures and Optical Properties of RF Magnetron Sputtering SiC Films[J]. Physical Testing and Chemical Analysis part A:Physical Testing, 2010, 46(12): 753~756
都智,李合琴,聂竹华,储汉奇,朱景超. 退火温度对磁控溅射SiC 薄膜结构和光学性能的影响[J]. 理化检验-物理分册, 2010, 46(12): 753~756
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参考文献
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【3】ZOLPER J C. Emerging silicon carbide power electronica components[C]//APEC 2005[S.l.]:[s.n.],2005:11-17.
【4】TANG Hui-dong,TAN Shou-hong,HUANG Zhen-gren,et al. Surface morphology of α-SiC coatings deposited by RF magnetron sputtering[J]. Surface & Coatings Technology,2005,197:161-167.
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【6】RAJAB S M,OLIVEIRA I C,MASSI M,et al. Effect of the thermal annealing on the electrical and physical properties of SiC thin films produced by RF magnetron sputtering[J]. Thin Solid Films,2006,515:170-175.
【7】孙运涛. 非晶碳化硅薄膜光学特性的热退火效应[J]. 嘉应学院学报(自然科学), 2008,26(3):34-37.
【8】陈长青, 毛旭, 周祯来, 等. 射频磁控溅射纳米SiC薄膜及其拉曼和红外分析[J]. 功能材料,2004,35:1232-1235.
【9】毛旭, 陈长青, 周祯来, 等. 磁控溅射生长SiC薄膜的拉曼光谱研究[J]. 电子元件与材料,2005,24(8):20-22.
【10】BORDERS J A,PICRAUX S T,BEEZHOLD W. Formation of SiC in silicon by ion implantation[J]. Applied Physics Letters,1971,18:509-511.
【11】STRANE J W,STEIN H J,LEE S R,et al. Precipitation and relaxation in strained Si1-yCy/Si heterostructures[J]. Journal of Applied Physics,1994,76:3656-3668.
【12】刘忠良, 唐军, 任鹏, 等. 不同衬底温度下预沉积Ge对SiC薄膜生长的影响[J]. 真空科学与技术学报,2009,29(4):423-426.
【13】吴春瑜, 王中文, 高嵩. SiC埋层的红外吸收特性研究[J]. 辽宁大学学报,1999,26(4):349-351.
【14】沙振东,吴雪梅,诸葛兰剑. 退火温度对SiC薄膜结构和光学特性的影响[J]. 微细加工技术,2006(1):23-26.
【15】ZHUGE L J,WU X M,LI Q,et al. Origin of violet photoluminescence in SiO2 films co-doped with silicon and carbon[J]. Physics E:Low-dimensional Systems and Nanostructures,2004,23:86-91.
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