电容位移测量仪的校准与薄膜的磁致伸缩测量
THE CALIBRATION OF CAPACITANCE-DISPLACEMENT MICROMETER AND THE MEASUMENT OF THE MAGNETOSTRICTION COEFFICIENT OF THIN FILMS
摘 要
自制了一套电容位移测量仪的校准装置，并对DWS型电容位移测量仪进行了校准和标定，使位移测量仪在较宽的量程范围内获得的悬臂梁位移测量值的误差≤5%。通过采用经改进校准和标定的位移测量仪，利用悬臂梁-电容法测定了稀土超磁致伸缩薄膜样品的磁致伸缩系数λ，提高了测量精度。
超磁致伸缩薄膜
磁致伸缩系数
Cantilever-capacitance method
Giant magnetostrictive thin film
Magnetostriction coefficient
Abstract
By using a self-constructed equipment, the DWS type Capacitance-displacement micrometer was calibrated accurately and the error area of Cantilever displacement is lower than 5% in the large measuring range. The magnetostriction coefficient of a cantilever magnetostrictive thin film was measured through Capacitance-displacement method and the results were satisfied.
中图分类号 TM27 TP212
所属栏目
基金项目 福建省科技厅高新技术与火炬计划项目(99-H-44);福州大学科技发展基金(XKJ(QD)-01/3);福州大学开放测试基金(2005035)
收稿日期 2005/12/6
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备注姜华(1980-)，男，硕士研究生。
引用该论文: JIANG Hua,ZHOU Bai-yang,CHEN Hong-bin,DENG Guang-hua. THE CALIBRATION OF CAPACITANCE-DISPLACEMENT MICROMETER AND THE MEASUMENT OF THE MAGNETOSTRICTION COEFFICIENT OF THIN FILMS[J]. Physical Testing and Chemical Analysis part A:Physical Testing, 2006, 42(5): 235～238
姜华,周白杨,陈鸿彬,邓光华. 电容位移测量仪的校准与薄膜的磁致伸缩测量[J]. 理化检验－物理分册, 2006, 42(5): 235～238
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参考文献
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【3】Lim S H, Kim H J, Na S M, et al. Application-Related Properties of Giant Magnetostrictive Thin Films[J]. Journal of Magnetism and Magnetic Materials, 2002,239:546-550.
【4】Klokholm E. The Measurement of Magnetostriction in Ferromagnetic Thin Films[J]. IEEE Trans Magn, 1976,12:879.
【5】Forester D W, Vittoria C, Schelleng J, et al. Magnetostriction of a Morphous TbxFe(1-x) Thin Films[J]. J Appl Phys, 1978,49(3):81.
【6】Andrew C Tam. A New High-Precision Optical Technique to Measure Magnetostriction of a Thin Magnetic Film Deposited on a Substrate[J]. IEEE Transactions on Magnetics, 1989,25(3):2630.
【7】万 红,邱 佚,谢海涛,等.电容位移法精确测量磁性薄膜的磁致伸缩系数[J].功能材料, 2002,33(3):262-264.
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