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用原子力显微镜分析Al2O3抛光处理的ITO玻璃表面形貌
          
SURFACE CHARACTERISTIC OF ITO GLASS POLISHED Al2O3 USING ATOMIC FORCE MICROSCOPY

摘    要
利用原子力显微镜(AFM)研究有机电致发光器件的阳极材料铟锡氧化物(ITO)玻璃的表面形貌。结果表明,用不同粒度Al2O3抛光液处理以及用相同粒度Al2O3抛光液在不同超声时间处理的ITO表面形貌都有不同程度的变化,所制备的有机电致发光器件(OLED)性能也有相应的改变,制备的OLED的最大亮度由12 350 cd/m2提高到25 880 cd/m2,最大效率也提高了50%。基于AFM形貌研究,确定了OLED的优化条件。
标    签 原子力显微镜   铟锡氧化物   抛光处理   有机电致发光器件   Atomic force microscopy   Indium tin oxide   Polishing treatment   Organic light-emitting device  
 
Abstract
The surface characteristic of Indium-Ti-Oxide were observed using atomic force microscopy. The results indicated that there were differences between surface characteristic of ITO glass after polished by containing different granularity Al2O3 solutions,so did containing uniform granularity Al2O3 while different ultrasonic treatment. Performance changed with the different ITO glass surface characteristic. The maximum brightness was promoted from 12 350 cd/m2 to 25 880 cd/m2 after treatment,and the maximum efficiency could increase 50%. Optimization conditions of manufacture OLED were confirmed according the surface characteristic study using AFM.

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引用该论文: GENG Li-wei,ZHANG Xiao-yan,WANG Li,WANG Guang-de. SURFACE CHARACTERISTIC OF ITO GLASS POLISHED Al2O3 USING ATOMIC FORCE MICROSCOPY[J]. Physical Testing and Chemical Analysis part A:Physical Testing, 2007, 43(9): 433~436
耿立威,张晓燕,王 立,王广德. 用原子力显微镜分析Al2O3抛光处理的ITO玻璃表面形貌[J]. 理化检验-物理分册, 2007, 43(9): 433~436


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参考文献
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