RF溅射稀土(La,Nd)掺杂ZnO薄膜的结构
RESEARCH OF STRUCTURAL PROPERTIES OF RE-DOPED ZnO THIN FILMS GROWN BY RF MAGNETRON SPUTTERING
摘 要
通过射频磁控溅射技术在Si(111)衬底上制备了未掺杂和镧、钕掺杂ZnO薄膜。XRD分析表明,ZnO薄膜具有c轴择优生长,镧、钕掺杂ZnO薄膜为自由生长的纳米多晶薄膜。用AFM观测薄膜的表面形貌,镧、钕掺杂ZnO薄膜表面形貌粗糙。
ZnO薄膜
X射线衍射分析
原子力显微镜
射频磁控溅射
RE-doped
ZnO thin film
XRD
AFM
RF magnetron sputtering
Abstract
The ZnO thin film and rare earth (RE=La,Nd) doped ZnO thin films were deposited on Si(111) substrate by RF magnetron sputtering and annealed at 400℃ under air. As analyzed by XRD,ZnO thin films with high c-axis orientation growth was realized,RE-doped ZnO thin films were nano-multi-crystal thin films with free growth. The rough surface morphology of RE-doped ZnO thin films were observed by AFM.
中图分类号 O484 TN304
所属栏目 试验与研究
基金项目
收稿日期 2007/9/24
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备注文 军(1962-),男,硕士。
引用该论文: WEN Jun,CHEN Chang-le,PAN Feng. RESEARCH OF STRUCTURAL PROPERTIES OF RE-DOPED ZnO THIN FILMS GROWN BY RF MAGNETRON SPUTTERING[J]. Physical Testing and Chemical Analysis part A:Physical Testing, 2008, 44(4): 172～174
文 军,陈长乐,潘 峰. RF溅射稀土(La,Nd)掺杂ZnO薄膜的结构[J]. 理化检验－物理分册, 2008, 44(4): 172～174
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参考文献
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【7】LI W J,SHI E W,ZHONG W Z,et al. Growth mechanism and growth habit of oxide crystals［J］. Journal of Crystal Growth,1999,203(122):186-196．
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【9】王恩哥.薄膜生长中的表面动力学(Ⅰ)［J］.物理学进展,2003,23(1):1-61．
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