气相色谱法分析超高纯六氟化钨中杂质气体
GC Analysis for Impurity Gases in Tungsten Hexa-fluoride of Super-purity
摘 要
采用气相色谱-放电离子化检测器分析超高纯六氟化钨中微量杂质气体的含量.自行设计了一套反吹双通路分析系统,当六氟化钨中的气相杂质进入检测器后,将六氟化钨及时反吹出去,避免六氟化钨对仪器的腐蚀.通过正交试验确定了气相色谱仪的最佳工作参数,确定了采用不同的色谱柱进行分析时,仪器的最佳反吹时间.据此提出了气相色谱法分析六氟化钨中的四氟化碳、二氧化碳、六氟化硫、氧气、氮气和一氧化碳等痕量杂质气体.
六氟化钨
正交试验
反吹
GC
Tungsten hexa-fluoride
Orthogonal test
Back-blowing
Abstract
A method of GC with discharge ionization detector (DID) for the determination of impurity gases in tungsten hexa-fluoride (WF6) of super-purity was proposed and the installation of binary-channel analytic system for back-blowing was designed. When the impurity gases in WF6 enter into the detector,the matrix WF6 was blown out in time in order to prevent the instrument from corrosion by WF6. By using the orthogonal experimental designing,the optimized working conditions of the GC instrument were selected. The optimum time of back-blowing for using different columns were also studied. Under the optimum conditions,the contents of CF4,CO2,SF6,O2,N2 and CO in WF6 were determined.
中图分类号 O657.7
所属栏目 工作简报
基金项目
收稿日期 2009/4/25
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备注郑秋艳(1983-),女,山东德州人,硕士研究生,主要研究特种气体的分析及各种相关的研发工作.
引用该论文: ZHENG Qiu-yan,WANG Shao-bo,WANG Zhan-wei,LI Ben-dong,LI Shao-bo. GC Analysis for Impurity Gases in Tungsten Hexa-fluoride of Super-purity[J]. Physical Testing and Chemical Analysis part B:Chemical Analysis, 2010, 46(8): 903～905
郑秋艳,王少波,王占卫,李本东,李绍波. 气相色谱法分析超高纯六氟化钨中杂质气体[J]. 理化检验－化学分册, 2010, 46(8): 903～905
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参考文献
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【9】SEMI C 3.52-0200Standard for tungsten hexafluoride,99.996% quality[S]．
【2】柳彤,王少波,李本东,等.高纯六氟化钨的生产工艺综述[J].舰船防化,2007(3):16-20．
【3】孙福楠,吴江红,王秋娥.敢问中国电子气体路在何方[J].低温与特气,2005,23(6):20-23．
【4】郑秋艳,王少波,王占卫,等.高纯六氟化钨的分析方法综述[J].化工新型材料,2008,36(7):15-16．
【5】付嫚,董露荣,于伟,等.电子特种气体及我国发展现状[J].舰船防化,2006(4):40-42．
【6】郑秋艳,王少波,李绍波.电子气体主要杂质分析方法综述[J].低温与特气,2008,26(1):13-18．
【7】HUNT R D,ANDREWS L. Infrared spectra of UF6,WF6,MoF6 and SF6 complexes with hydrogen fluoride in solid argon[J]. J Phys Chem,1991(95):1183-1188．
【8】JOHANNES B L,JOHANNES P C,JOHN M S. Gas chromatographic analysis of trace gas impurities in tungsten hexafluoride[J]. Journal of Chromatography A,2001,911:107-112．
【9】SEMI C 3.52-0200Standard for tungsten hexafluoride,99.996% quality[S]．
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