微波等离子体用于消除温室气体全氟化物的研究进展
Recent Progress on Application of Microwave Plasma to Eliminating Perfluoro Compounds
摘 要
根据文献报道,评述了1997-2009年以来微波等离子体用于消除温室气体全氟化物的研究进展.介绍了几类微波等离子体系统,包括放电管型微波等离子体、微波等离子体共振腔反应器、炬型微波等离子体等(引用文献31篇).
全氟化物
消除率
综述
Microwave plasma
Perfluoro compounds
Abatement rate
Review
Abstract
A review was given on the recent progress of application of microwave plasma to eliminating perfluoro compounds covering years from 1997-2009,relating especially to several kinds of microwave plasma,including the discharge tube microwave plasma,the microwave resonant cavity reactor,the torch microwave plasma,and their application to eliminating perfluoro compounds (31 ref.cited).
中图分类号 X701.7
所属栏目 综述
基金项目
收稿日期 2009/3/15
修改稿日期
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备注金海燕(1958-),女,吉林省长春市人,高级工程师,研究方向为液-质联机检测分析.
引用该论文: JIN Hai-yan,WANG Xing-hua,WANG Bao-jun,FENG Guo-dong. Recent Progress on Application of Microwave Plasma to Eliminating Perfluoro Compounds[J]. Physical Testing and Chemical Analysis part B:Chemical Analysis, 2010, 46(9): 1099～1103
金海燕,王兴华,王宝君,冯国栋. 微波等离子体用于消除温室气体全氟化物的研究进展[J]. 理化检验－化学分册, 2010, 46(9): 1099～1103
被引情况:
【1】周 强,梁婷婷,年季强,朱春要, "电感耦合等离子体原子发射光谱法测定粘结后的锂离子电池三元正极材料中痕量铁",理化检验－化学分册 52, 937-940(2016)
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参考文献
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【2】KARECKI S,PRUETTE L,REIF R,et al.J Electrochem Soc[J],1998,145(12):4305-4312．
【3】ALLGOOD C,MOCELLA M,CHAE H Y,et al.J Electrochem Soc[J],2003,150(2):122-126．
【4】RIDGEWAY R G,LANGAN J G,HULING B A,et al.Contamination control[C]//Annual Technical Meeting.[S.l.]: Institute of Environmental Sciences-Proceedings,1995:480-486．
【5】CUMMINS W R,GILLIAND S,KESARI S,et al.Semicond Int[J],1997,20(8):265-272．
【6】YABUHARA Y.A Study of Abatement Technology on PFC Gases: Recent Advances in the PFC Emission Reduction Technologies[C]//Proceedings of the Fourth International Environment Safety &Health Conference of the Semiconductor Industry,session 7 (Perfluorinated Compounds).[S.l.]:[s.n.],1997:7．
【7】VITALE S A,SAWIN H H.J Vac Sci Technol A[J],2000,18(5):2217-2223．
【8】XU X,RAUF S,KUSHNER A.J Vac Sci Technol A[J],2000,18(1):213-231．
【9】TONNIS E J,GRAVES D B,VARTANIAN V H,et al.J Vac Sci Technol A[J],2000,18(2):393-400．
【10】CHANG M B,YU S J.Environ Sci Technol[J],2001,35(8):1587-1592．
【11】CHEN X,HOLLBER W,PETER M.Proc Electrochem Soc[J],2000(7):1-9．
【12】ICHIKAWA S,KANNO S,KUROKAWA H,et al.Catalytic decomposition of perfluorocarbons (PFC′s)[C]//Proceedings of the Seventh International Semiconductor ESH Conference.[S.l.]:[s.n.],2000:27．
【13】HACKMAN R,AKIYAMA H.IEEE Trans Dielectr Electr Insul[J],2000,7(5):654-683．
【14】URASHIM K,CHANG J S.IEEE Trans Dielectr Electr Insul[J],2000,7(5):602-614．
【15】BROWN R S,ROSSIN J A,AITCHISON K.Solid State Technol[J],2001,46(7):189-194．
【16】BROWN R S,ROSSIN J A,THOMAS C J.Semicond Int[J],2001,24(6):209-216．
【17】URASHIM K,KOSTOV K G,JEN-SHIH C,et al.IEEE Trans Ind Appl[J],2001,37(5):1456-1463．
【18】HONG Y C,KIM H S,UHM H S.Thin Solid Films[J],2003,435(1/2):329-334．
【19】CHANG M,LEE H.Catalysis Today[J],2004,89:109-115．
【20】金钦汉,戴树珊,黄卡玛.微波化学[M].北京:科学出版社,1999:205．
【21】RADOIU M T.Radiation Physics and Chemistry[J],2004,69(2):113-120．
【22】WOFFORD B A,JACKSON M W,HARTZ C,et al.Environ Sci Technol[J],1999,33(11):1892-1897．
【23】HARTZ C,BEVAN W,JACKSON M W.Environ Sci Technol[J],1998,32(5):682-687．
【24】KABOUZI Y,MOISAN M,ROSTAING J C.J Appl Phys[J],2003,93(12):9483-9496．
【25】HONG Y C,UHM H S,CHUN B J,et al.Microwave Plasma Torch Abatement of NF3 and SF6[C]//XXVIIth ICPIG.Eindhoven: [s.n.],2005:18-22．
【26】RADOIU M T.Environ Sci Technol[J],2003,37(17):3985-3988．
【27】MOISAN M,ZAKRZEWSKI Z,ROSTAINING J C.Plasma Sources Sci Technol[J],2001,10(3):387-394．
【28】MIZERACZYK J,JASINSKI M,ZAKRZEWSKI Z.Plasma Phys Control Fusion[J],2005,47(12B):B589-B602．
【29】JASINSKI M,MIZERACZYK J,ZAKRZEWSKI Z.J Phys D: Appl Phys[J],2002,35(18):2274-2280．
【30】TSAI C H,KUO Z Z.J Hazard Mater[J],2009,161:1478-1483．
【31】NAGAI M,HORI M,GOTO T.J Appl Phys[J],2005,97(12):123304-123308．
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