Effect of Nitrogen Flow Rate on Properties of CrNx Coatings Prepared by Reactive Magnetron Sputtering
摘 要
通过控制氮气流量(20~60 cm3·min-1),采用反应磁控溅射技术分别在不锈钢和硅片基底上制备CrNx涂层,研究了氮气流量对涂层物相组成、显微组织、纳米压痕力学性能、摩擦学性能以及在质量分数3.5% NaCl溶液中电化学腐蚀性能的影响。结果表明:不同氮气流量下的CrNx涂层均表现出柱状晶结构;随着氮气流量的增加,CrNx涂层的物相经历了Cr→Cr2N→CrN的变化,纳米压痕硬度和弹性模量均先增后降,平均摩擦因数和磨损率先降后增再降,耐腐蚀性能则先变好后变差;当氮气流量为30 cm3·min-1时,涂层结构致密,力学性能、耐磨性能和耐腐蚀性能最优。
Abstract
CrNx coatings were prepared by reactive magnetron sputtering with controlled nitrogen flow rates (20-60 cm3·min-1) on stainless steel and silicon chip substrate, respectively. The influence of nitrogen flow rate on the phase composition, microstructure, nanoindentation mechanical properties, tribological properties, and electrochemical corrosion resistance in 3.5wt% NaCl solution of the coatings was investigated. The results show that the CrNx coatings all had columnar crystal structures at different nitrogen flow rates. With the increase of nitrogen flow rate, the phase composition of the coatings changed in order of Cr, Cr2N and CrN; the nanoindentation hardness and elastic modulus increased first and then decreased; the average friction coefficient and the wear rate decreased first, then increased and then decreased; the corrosion resistance got better first and then got worse. When the nitrogen flow rate was 30 cm3·min-1, the coating had a dense structure and the best mechanical properties, wear resistance and corrosion resistance.
中图分类号 TG174.4 DOI 10.11973/jxgccl202004005
所属栏目 试验研究
基金项目 国家自然科学基金资助项目(51475450);国家重点研发项目(2016YFB0300604)
收稿日期 2019/3/18
修改稿日期 2020/2/28
网络出版日期
作者单位点击查看
备注郭金保(1982-),男,河北沧州人,工程师,学士
引用该论文: GUO Jinbao,MA Fuliang,ZENG Zhixiang. Effect of Nitrogen Flow Rate on Properties of CrNx Coatings Prepared by Reactive Magnetron Sputtering[J]. Materials for mechancial engineering, 2020, 44(4): 25~29
郭金保,马付良,曾志翔. 氮气流量对反应磁控溅射制备CrNx涂层性能的影响[J]. 机械工程材料, 2020, 44(4): 25~29
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参考文献
【1】XU J H,UMEHARA H,KOJIMA I.Effect of deposition parameters on composition,structures,density and topography of CrN films deposited by r.f. magnetron sputtering[J].Applied Surface Science, 2002,201(1/2/3/4):208-218.
【2】OLAYA J J,RODIL S E,MUHL S,et al.Comparative study of chromium nitride coatings deposited by unbalanced and balanced magnetron sputtering[J].Thin Solid Films, 2005,474(1/2):119-126.
【3】INOUE S,OKADA F,KOTERAZAWA K.CrN films deposited by rf reactive sputtering using a plasma emission monitoring control[J].Vacuum, 2002,66(3/4):227-231.
【4】CHIM Y C,DING X Z,ZENG X T,et al.Oxidation resistance of TiN,CrN,TiAlN and CrAlN coatings deposited by lateral rotating cathode arc[J]. Thin Solid Films,2009,517(17):4845-4849.
【5】SEOK J W,JADEED N M,LIN R Y.Sputter-deposited nanocrystalline Cr and CrN coatings on steels[J]. Surface and Coatings Technology, 2001,138(1):14-22.
【6】NAM K H,JUNG M J,HAN J G.A study on the high rate deposition of CrNx films with controlled microstructure by magnetron sputtering[J]. Surface and Coatings Technology,2000,131(1/2/3):222-227.
【7】SUE J A,CHANG T P.Friction and wear behavior of titanium nitride,zirconium nitride and chromium nitride coatings at elevated temperatures[J]. Surface and Coatings Technology, 1995,76/77:61-69.
【8】HONES P,SANJINES R,LEVY F.Characterization of sputter-deposited chromium nitride thin films for hard coatings[J]. Surface and Coatings Technology, 1997,94/95:398-402.
【9】REBHOLZ C,ZIEGELE H,LEYLAND A,et al.Structure,mechanical and tribological properties of nitrogen-containing chromium coatings prepared by reactive magnetron sputtering[J].Surface and Coatings Technology, 1999,115(2/3):222-229.
【10】李戈扬,张俊秋,韩增虎,等.氮分压对CrNx薄膜相结构与力学性能的影响[J].电子显微学报,2002,21(5):629-630.
【11】田俊红.磁控溅射制备CrNx薄膜及其结构和性能研究[J].真空与低温,2007,13(3):159-162.
【12】OLIVER W C,PHARR G M.An improved technique for determining hardness and elastic modulus using load and displacement sensing indentation experiments[J].Journal of Materials Research, 1992,7(6):1564-1583.
【13】KONG Q H,JI L,LI H X,et al.Composition,microstructure,and properties of CrNx films deposited using medium frequency magnetron sputtering[J].Applied Surface Science,2011,257(6):2269-2274.
【14】SANJINÉS R,HONES P,LÉVY F.Hexagonal nitride coatings:Electronic and mechanical properties of V2N,Cr2N and δ-MoN[J].Thin Solid Films,1998,332(1/2):225-229.
【15】ARCHARD J F.Contact and rubbing of flat surfaces[J].Journal of Applied Physics, 1953,24(8):981-988.
【16】MA F L,LI J L,ZENG Z X,et al.Structural,mechanical and tribocorrosion behaviour in artificial seawater of CrN/AlN nano-multilayer coatings on F690 steel substrates[J].Applied Surface Science,2018,428:404-414.
【2】OLAYA J J,RODIL S E,MUHL S,et al.Comparative study of chromium nitride coatings deposited by unbalanced and balanced magnetron sputtering[J].Thin Solid Films, 2005,474(1/2):119-126.
【3】INOUE S,OKADA F,KOTERAZAWA K.CrN films deposited by rf reactive sputtering using a plasma emission monitoring control[J].Vacuum, 2002,66(3/4):227-231.
【4】CHIM Y C,DING X Z,ZENG X T,et al.Oxidation resistance of TiN,CrN,TiAlN and CrAlN coatings deposited by lateral rotating cathode arc[J]. Thin Solid Films,2009,517(17):4845-4849.
【5】SEOK J W,JADEED N M,LIN R Y.Sputter-deposited nanocrystalline Cr and CrN coatings on steels[J]. Surface and Coatings Technology, 2001,138(1):14-22.
【6】NAM K H,JUNG M J,HAN J G.A study on the high rate deposition of CrNx films with controlled microstructure by magnetron sputtering[J]. Surface and Coatings Technology,2000,131(1/2/3):222-227.
【7】SUE J A,CHANG T P.Friction and wear behavior of titanium nitride,zirconium nitride and chromium nitride coatings at elevated temperatures[J]. Surface and Coatings Technology, 1995,76/77:61-69.
【8】HONES P,SANJINES R,LEVY F.Characterization of sputter-deposited chromium nitride thin films for hard coatings[J]. Surface and Coatings Technology, 1997,94/95:398-402.
【9】REBHOLZ C,ZIEGELE H,LEYLAND A,et al.Structure,mechanical and tribological properties of nitrogen-containing chromium coatings prepared by reactive magnetron sputtering[J].Surface and Coatings Technology, 1999,115(2/3):222-229.
【10】李戈扬,张俊秋,韩增虎,等.氮分压对CrNx薄膜相结构与力学性能的影响[J].电子显微学报,2002,21(5):629-630.
【11】田俊红.磁控溅射制备CrNx薄膜及其结构和性能研究[J].真空与低温,2007,13(3):159-162.
【12】OLIVER W C,PHARR G M.An improved technique for determining hardness and elastic modulus using load and displacement sensing indentation experiments[J].Journal of Materials Research, 1992,7(6):1564-1583.
【13】KONG Q H,JI L,LI H X,et al.Composition,microstructure,and properties of CrNx films deposited using medium frequency magnetron sputtering[J].Applied Surface Science,2011,257(6):2269-2274.
【14】SANJINÉS R,HONES P,LÉVY F.Hexagonal nitride coatings:Electronic and mechanical properties of V2N,Cr2N and δ-MoN[J].Thin Solid Films,1998,332(1/2):225-229.
【15】ARCHARD J F.Contact and rubbing of flat surfaces[J].Journal of Applied Physics, 1953,24(8):981-988.
【16】MA F L,LI J L,ZENG Z X,et al.Structural,mechanical and tribocorrosion behaviour in artificial seawater of CrN/AlN nano-multilayer coatings on F690 steel substrates[J].Applied Surface Science,2018,428:404-414.
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