铝、硅元素添加对TiN基薄膜组织和性能的影响
Effect of Addition of Aluminum and Silicon Elements on Microstructure and Properties of TiN-based Film
摘 要
采用物理气相沉积（PVD）法制备TiN、Ti-Al-N和Ti-Si-N 3种薄膜，研究了铝和硅元素添加对薄膜组织和性能的影响。结果表明：Ti-Al-N薄膜组织中Ti3AlN相存在择优取向，形成了粗大的柱状晶；Ti-Si-N薄膜生成了Si3N4相，组织相对细小；Ti-Al-N薄膜的膜基结合力最小，Ti-Si-N薄膜的膜基结合力最大；Ti-Al-N薄膜的表面粗糙度最小，硬度和弹性模量最大；Ti-Si-N薄膜的摩擦因数略高于Ti-Al-N薄膜的，但二者相差很小，这应与Ti-Si-N薄膜组织较细小且形成的Si3N4相具有一定的自润滑性能有关。
表面粗糙度
膜基结合力
摩擦因数
择优取向
physical vapor deposition
surface roughness
film base bonding force
friction coefficients
preferred orientation
Abstract
Three films of TiN, Ti-Al-N and Ti-Si-N were prepared by physical vapor deposition (PVD). The influence of aluminum and silicon addition on microstructure and properties of films was studied. The results show that the Ti3AlN phase existed preferred orientatian in microstructure of Ti-Al-N film, and a coarse columnar crystal microstructure formed. The Si3N4 phase formed in Ti-Si-N film, and the microstructure of Ti-Si-N film was more fine. The film base bonding force was the smallest of Ti-Al-N film and was the largest of Ti-Si-N film. The Ti-Al-N film had the smallest surface roughness and the largest hardness and elastic modulus.The friction factor of Ti-Si-N film was slightly higher than that of Ti-Al-N film, but the difference between them was small, which should be related to the fact that the microstructure of Ti-Si-N film was fine, and Si3N4 phase formed by Ti-Si-N film had a certain self-lubricating property.
中图分类号 TG174.444 DOI 10.11973/jxgccl202012007
所属栏目 试验研究
基金项目 长春市科技支撑计划项目（11K246）
收稿日期 2019/12/10
修改稿日期 2020/11/11
网络出版日期
作者单位点击查看
备注郭力铭(1995—),男,辽宁鞍山人,硕士研究生
引用该论文: GUO Liming,DUAN Lili,YU Xiaofeng,WU Hua. Effect of Addition of Aluminum and Silicon Elements on Microstructure and Properties of TiN-based Film[J]. Materials for mechancial engineering, 2020, 44(12): 37～41
郭力铭,段利利,于晓丰,吴化. 铝、硅元素添加对TiN基薄膜组织和性能的影响[J]. 机械工程材料, 2020, 44(12): 37～41
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参考文献
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【23】DANG C Q, YAO Y R, OLUGBADE T, et al. Effect of multi-interfacial structure on fracture resistance of composite TiSiN/Ag/TiSiN multilayer coating[J]. Thin Solid Films, 2018, 653:107-112.
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【2】杨方亮, 王彦峰. 钛合金表面百微米级Ti/TiN多层复合涂层性能研究[J]. 表面技术, 2017(3):96-100.
【3】CHEN T, XIE Z W, GONG F, et al. Correlation between microstructure evolution and high temperature properties of TiAlSiN hard coatings with different Si and Al content[J]. Applied Surface Science, 2014, 314:735-745.
【4】KIM C W, KIM K H. Anti-oxidation properties of TiAlN film prepared by plasma-assisted chemical vapor deposition and roles of Al[J]. Thin Solid Films, 1997, 307(1/2):113-119.
【5】COLOMBO D A, MANDRI A D, ECHEVERRIA M D, et al. Mechanical and tribological behavior of Ti/TiN and TiAl/TiAlN coated austempered ductile iron[J]. Thin Solid Films, 2018, 647:19-25.
【6】VALLETI K, PUNEET C, RAMA KRISHNA L, et al. Studies on cathodic arc PVD grown TiCrN based erosion resistant thin films[J]. Journal of Vacuum Science & Technology A:Vacuum, Surfaces, and Films, 2016, 34(4):041512.
【7】LIU W, LI A Q, WU H D, et al. Effects of bias voltage on microstructure, mechanical properties, and wear mechanism of novel quaternary (Ti, Al, Zr)N coating on the surface of silicon nitride ceramic cutting tool[J]. Ceramics International, 2016, 42(15):17693-17697.
【8】邓世均. 高性能陶瓷涂层[M]. 北京:化学工业出版社, 2004.
【9】董文麟. 氮化硅陶瓷:新型无机非金属材料[M]. 北京:中国建筑工业出版社, 1987.
【10】BARSOUM M W, EL-RAGHY T, ALI M. Processing and characterization of Ti2AlC, Ti2AlN, and Ti2AlC0.5N0.5[J]. Metallurgical and Materials Transactions A, 2000, 31(7):1857-1865.
【11】翟甜蕾, 林国安, 姚波, 等. AlN/Cu复合导热基板的界面结合特性及显微结构[J]. 硅酸盐学报, 2017, 45(7):1037-1042.
【12】吴化, 陈涛, 宋力. PVD法制备(Ti, Al)N涂层中残余应力对其质量的影响[J]. 材料工程, 2013(2):60-64.
【13】ANDERS A. Approaches to rid cathodic arc plasmas of macro- and nanoparticles:A review[J]. Surface and Coatings Technology, 1999, 120/121:319-330.
【14】TAKIKAWA H, TANOUE H. Review of cathodic arc deposition for preparing droplet-free thin films[J]. IEEE Transactions on Plasma Science, 2007, 35(4):992-999.
【15】MA F L, LI J L, ZENG Z X, et al. Structural, mechanical and tribocorrosion behaviour in artificial seawater of CrN/AlN nano-multilayer coatings on F690 steel substrates[J]. Applied Surface Science, 2018, 428:404-414.
【16】JIN J, DUAN H J, LI X H. The influence of plasma nitriding on microstructure and properties of CrN and CrNiN coatings on Ti6Al4V by magnetron sputtering[J]. Vacuum, 2017, 136:112-120.
【17】PAIVA J, FOX-RABINOVICH G, LOCKS JUNIOR E, et al. Tribological and wear performance of nanocomposite PVD hard coatings deposited on aluminum die casting tool[J]. Materials, 2018, 11(3):358-373.
【18】WAN Q, DING H, YOUSAF M I, et al. Corrosion behaviors of TiN and Ti-Si-N (with 2.9 at.% and 5.0 at.% Si) coatings by electrochemical impedance spectroscopy[J]. Thin Solid Films, 2016, 616:601-607.
【19】CHANG Y Y, CHANG H, JHAO L J, et al. Tribological and mechanical properties of multilayered TiVN/TiSiN coatings synthesized by cathodic arc evaporation[J]. Surface and Coatings Technology, 2018, 350:1071-1079.
【20】DING J C, ZOU C W, WANG Q M, et al. Effect of bias voltage on the microstructure and hardness of Ti-Si-N films deposited by using high-power impulse magnetron sputtering[J]. Journal of the Korean Physical Society, 2016, 68(2):351-356.
【21】PALDEY S, DEEVI S C. Properties of single layer and gradient (Ti,Al)N coatings[J]. Materials Science and Engineering:A, 2003, 361(1/2):1-8.
【22】董瑜亮, 闫旭波, 赵升升, 等. (Ti, Al)N/Ti2AlN涂层的制备[J]. 金属学报, 2010, 46(6):743-747.
【23】DANG C Q, YAO Y R, OLUGBADE T, et al. Effect of multi-interfacial structure on fracture resistance of composite TiSiN/Ag/TiSiN multilayer coating[J]. Thin Solid Films, 2018, 653:107-112.
【24】田灿鑫, 周小东, 周思华, 等. 电弧离子镀制备TiSiN纳米复合涂层[J]. 表面技术, 2015, 44(8):15-19.
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