Ar-N2混合气体中N2含量对磁控溅射Ag膜性能的影响
Effect of N2 Content in Ar-N2 Gas Mixture on Properties of Ag Films Deposited by Magnetron Sputtering
摘 要
以不同N2含量Ar-N2混合气体为溅射气体在聚对苯二甲酸乙二醇酯(PET)基膜上磁控溅射制备Ag膜,研究了N2含量对Ag膜动态沉积率、耐盐雾腐蚀性能和反射率的影响。结果表明:随着N2含量增加,制备的Ag膜的晶粒尺寸逐渐减小,在盐雾中的腐蚀速率逐渐降低,动态沉积率和反射率均逐渐降低;综合生产效率和各项性能,优选N2体积分数为20%的Ar-N2混合气体溅射Ag膜工艺,其动态沉积率为纯Ar制备Ag膜的95%,反射率也由纯Ar制备Ag膜的93.8%降低至93.4%,在盐雾中的腐蚀速率降为纯Ar制备Ag膜的22%左右。
磁控溅射
Ar-N2混合气体
耐盐雾腐蚀性能
Ag film
magnetron sputtering
Ar-N2 gas mixture
salt spray corrosion resistance
Abstract
Ag films were prepared on polyethylene terephthalate (PET) base film by magnetron sputtering using Ar-N2 gas mixture with different N2 content as sputtering gas. The effects of N2 content on dynamic deposition rate, salt spray corrosion resistance and reflectivity of the Ag film were studied. The results show that with the increase of N2 content, the grain size of the prepared Ag film gradually decreased, the corrosion rate in salt spray, dynamic deposition rate and reflectivity decreased gradually. In terms of production efficiency and properties, it was preferable to use the Ar-N2 gas mixture sputtering Ag film process with N2 volume fraction of 20%. The dynamic deposition rate of the Ag film prepared by the preferable process was 95% of that of Ag film prepared with pure Ar, while the reflectivity was only reduced from 93.8% that of the Ag film prepared with pure Ar to 93.4%, and the corrosion rate in salt spray was reduced to about 22% of that of Ag film prepared with pure Ar.
中图分类号 TG174.4 DOI 10.11973/fsyfh-202208010
所属栏目 试验研究
基金项目 宁波市科技计划体系项目(2019B10136)
收稿日期 2020/9/18
修改稿日期
网络出版日期
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引用该论文: ZHAO Jinling,ZHAI Huailun,YAN Yulei,YIN Zhengjie,XU Jingtao,WANG Minghui. Effect of N2 Content in Ar-N2 Gas Mixture on Properties of Ag Films Deposited by Magnetron Sputtering[J]. Corrosion & Protection, 2022, 43(8): 51
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【3】ZHAI Y,MA Y G,DAVID S N,et al.Scalable-manufactured randomized glass-polymer hybrid metamaterial for daytime radiative cooling .Science,2017,355(6329):1062-1066.
【4】ZHAO D L,AILI A,ZHAI Y,et al.Subambient cooling of water:toward real-world applications of daytime radiative cooling .Joule,2019,3(1):111-123.
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【6】ALVISI M,GIULIO M D,MARRONE S G,et al.HfO2 films with high laser damage threshold .Thin Solid Films,2000,358(1/2):250-258.
【7】ALVISI M,DE NUNZIO G,PERRONE M R,et al.Influence of the assisting-ion-beam parameters on the laser-damage threshold of SiO2 films .Thin Solid Films,1999,338(1/2):269-275.
【8】谢致薇,蒙继龙,王国庆.物理气相沉积薄膜的界面与附着力 .真空科学与技术,2001,21(3):203-209.
【9】MINAMIDE Y,KAWAMURA M,ABE Y,et al.Agglomeration suppression behavior and mechanisms of Ag-Cu and Ag-Nb thin films .Vacuum,2009,84(5):657-662.
【10】KAWAMURA M,KIBA T,ABE Y,et al.Metal nanolayer deposited highly stable Ag thin films and their optical properties .Journal of Physics:Conference Series,2018,987:012002.
【11】SUGAWARA K,MINAMIDE Y,KAWAMURA M,et al.Agglomeration behavior of Ag films suppressed by alloying with some elements .Vacuum,2008,83(3):610-613.
【12】GU D E,ZHANG C,WU Y K,et al.Ultrasmooth and thermally stable silver-based thin films with subnanometer roughness by aluminum doping .ACS Nano,2014,8(10):10343-10351.
【13】NAKANISHI Y,KATO K,OMOTO H,et al.Improvement in salt-water durability of Ag thin films deposited by magnetron sputtering using argon and nitrogen mixed gas .Vacuum,2013,87:232-236.
【14】HU Y H,ZHU J J,ZHANG C,et al.Understanding the preferred crystal orientation of sputtered silver in Ar/N2 atmosphere:a microstructure investigation .Advances in Materials Science and Engineering,2019,2019:3079393.
【15】MANSOUR M M,EL-SAYED N M,FARAG O F,et al.Effect of He and Ar addition on N2 glow discharge characteristics and plasma diagnostics .Arab Journal of Nuclear Sciences and Applications,2013,46(1):116-125.
【16】FRITSCHE B,CHEVOLLEAU T,KOURTEV J,et al.Plasma diagnostic of an RF magnetron Ar/N2 discharge .Vacuum,2002,69(1/2/3):139-145.
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