提出了有机加氧进样系统结合三重四极杆电感耦合等离子体质谱法测定集成电路用N-甲基吡咯烷酮(NMP)中Na、Cd、Pb、Mg、Al、Ca、Cr、Mn、Fe、Co、Ni、Cu、Zn、K等14种金属杂质含量的方法。通过氧气在线燃烧的方式降低了碳沉积对锥口的影响,采用标准加入法匹配基体效应,使用冷等离子体-氨气碰撞反应模式解决了碳元素质谱干扰的问题,如¹²C¹²C⁺对²⁴Mg⁺的干扰,¹²C⁴⁰Ar⁺对⁵²Cr⁺的干扰。14种元素的加标回收率为83.2%~123%,14种元素工作曲线的相关系数均大于0.999 0,方法可用于分析杂质元素质量分数低于20.00 ng·kg^-1的样品,满足先进制程的质量要求。

A method was proposed for determination of 14 metal impurities in N-methylpyrrolidone (NMP), including Na, Cd, Pb, Mg, Al, Ca, Cr, Mn, Fe, Co, Ni, Cu, Zn, and K, by triple quadrupole inductively coupled plasma mass spectrometry with the organic additional oxygen sampling system. The impact of carbon deposition on the cone was reduced through oxygen online combustion. The standard addition method was used for matching the matrix effect, and the mass interference from carbon element was eliminated by the cold plasma-ammonia gas collision reaction mode, such as the interferences of ¹²C¹²C⁺ on ²⁴Mg⁺ and ¹²C⁴⁰Ar⁺ on ⁵²Cr⁺. The spiked recoveries of 14 elements were 83.2%-123%, and the correlation coefficients of calibration curves for 14 elements were better than 0.999 0. This method was applied to the analysis of samples with mass fraction less than 20.00 ng·kg^-1, which could meet the quality requirements of advanced production processes.