反应磁控溅射方法制备CNx薄膜的高温抗氧化性能
High Temperature Oxidation Resistance of CNx Thin Films Prepared by Reactive Magnetron Sputtering
摘 要
采用反应磁控溅射方法在高速钢基体上制备了CNx薄膜, 通过改变氮气和氩气的流量比来调整CNx薄膜中的氮含量, 并采用XRD、HR-TEM、SEM、FTIR和显微硬度计等对薄膜的结构及其在300, 400, 500, 600 ℃下的高温抗氧化性能进行了表征。结果表明: CNx薄膜在400 ℃以下具有较好的抗氧化性能, 当氧化温度达到500 ℃后薄膜会发生严重氧化和分解; CNx薄膜中氮含量的增加有利于改善薄膜的高温抗氧化性能。
抗氧化性能
氮含量
反应磁控溅射
CNx thin film
oxidation resistance
nitrogen content
reactive magnetron sputtering
Abstract
CNx thin films were deposited on high speed steel (HSS) substrates by reactive magnetron sputtering (RMS), and nitrogen content in the thin films was adjusted by changing the flow ratio of N2 to Ar. The structure of the film and its high temperature oxidation resistance at 300, 400, 500, 600 ℃ was studied by XRD, HR-TEM, SEM and FTIR. The results indicate that the CNx thin films had good oxidation resistance at below 400 ℃, and oxidation annealing temperature of 500 ℃ led to serious oxidation or decomposition. Higher nitrogen content was helpful to high temperature oxidation resistance of the CNx thin films.
中图分类号 TG174.44
所属栏目 材料性能及其应用
基金项目 安徽理工大学青年教师资助项目
收稿日期 2013/4/8
修改稿日期 2014/2/16
网络出版日期
作者单位点击查看
备注陈向阳(1979-), 男, 河南周口人, 讲师, 博士。
引用该论文: CHEN Xiang-yang,ZHANG Jin,HU Hai-xia,ZHOU Zhe-bo. High Temperature Oxidation Resistance of CNx Thin Films Prepared by Reactive Magnetron Sputtering[J]. Materials for mechancial engineering, 2014, 38(5): 71～75
陈向阳,张瑾,胡海霞,周哲波. 反应磁控溅射方法制备CNx薄膜的高温抗氧化性能[J]. 机械工程材料, 2014, 38(5): 71～75
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【4】江锦春, 程文娟, 张阳, 等.微波等离子体化学气相沉积制备碳氮晶体薄膜［J］.人工晶体学报, 2004(6):58-62,67.
【5】ZHENG W T, BROITMAN E, HELLGREN N, et al. Reactive magnetron sputtering of CNx thin films at different substrate bias［J］.Thin Solid Films,1997,308/309:223-227.
【6】NEIDHARDT J, HULTMAN L, BROITMAN E, et al. Structural, mechanical and tribological behavior of fullerene-like and amorphous carbon nitride coatings［J］.Diamond and Related Materials,2004,13:1882-1888.
【7】KATO K, UMEHARA N, ADACHI K. Friction, wear and N2 lubrication of carbon nitride coatings:a review［J］.Wear,2003,254:1062-1069.
【8】BROITMAN E, ZHENG WT, SJOSTROM H, et al. Stress development during deposition of CNx thin films［J］.Applied Physics Letters,1998,72:2532-2534.
【9】PEPONAS S, GUEDDAB M, BENLAHSEN M. On the post-contamination effect on the delamination of sputtered amorphous carbon nitride films［J］.Solid State Communications,2008,146:78-82.
【10】LIU D G, TU J P, HONG C F, et al. Improving mechanical properties of a-CNx films by Ti-TiN/CNx gradient multilayer［J］.Applied Surface Science,2010,257:487-494.
【11】FERNANDEZ-RAMOS C, SANCHEZ-LOPEZ JC, BELIN M, et al. Tribological and mechanical properties of CNx- and SiCNx-TiN/Ti multilayered systems grown onto steel［J］.Vacuum,2002,67:551-558.
【12】LIU D G, TU J P, ZHANG H, et al. Microstructure and mechanical properties of carbon nitride multilayer films deposited by DC magnetron sputtering［J］. Surface and Coa-tings Technology,2011,205:3080-3086.
【13】ZHANG X C, XU B S, WANG H D, et al. Effect of graded interlayer on the mode I edge delamination by residual stre-sses in multilayer coating-based systems［J］.Appl Surf Sci,2008,254:1881-1889.
【14】ZHANG X C, XU B S, WANG H D, et al. Application of functionally graded interlayer on reducing the residual stress discontinuities at interfaces within a plasma-sprayed thermal barrier coating［J］.Surf Coat Technol,2007,201:5716-5719.
【15】郭怀喜, 吴大维, 何孟兵, 等.氮化碳薄膜的耐腐蚀性和热稳定性研究［J］.材料科学与工程, 1998, 16 (1): 47-49.
【16】DONG Z B, LU Y F, GAO K, et al. Thermal stability of carbon nitride thin films prepared by electron cyclotron resonance plasma assisted pulsed laser deposition［J］.Thin Solid Films,2008,516:8594-8598.
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