采用阴极多弧离子镀膜技术,在AZ91C镁合金基底上首次成功镀制了结合力强的以Ti为过渡层的TiN复合膜层,并利用高分辨扫描电子显微镜(SEM)、X射线能谱仪(EDS)、显微划痕测试等技术对复合膜层的形貌、组织结构及性能进行分析研究.结果表明,采用多弧离子镀膜工艺,能在经过恰当预处理的镁合金基底上制备出性能良好的TiN膜,膜层均匀、致密,膜基结合力达130 mN以上,复合硬度达500 HV左右(AZ91镁合金基底为125 HV).此外中性盐雾强化实验表明,经该方法处理后的镁合金在ASTM-B117标准测试条件下,腐蚀速率明显降低,经过200 h后,表面无明显腐蚀现象.真空多弧离子镀膜技术有望在镁合金表面防护领域得到应用.

TiN films grown on Ti as interlayers were prepared on AZ91C magnesium alloy substrate by cathodic multi arc ion plating.The surface morphology,microstructure and hardness of the films were examined using high-resolution scanning electron microscope(SEM),X-ray energy diffraction spectrometers(EDS)and microcharacter hardness tester.The results show that TiN films with good performance can be obtained on the properly pretreated magnesium substrate by the multi arc ion plating technique.The adhesion force between the film and substrate was over 130 mN,and the complex hardness of the films was about 500 HV whereas that of AZ91C magnesium alloy was about 125 HV.The neutral salt spray accelerated testing indicated that corrosion rate of magnesium alloy after treated by this method declined significantly under ASTM-117 standard test condition.The surface of the films was not corroded obviously after salt spray test for 200 h.Vacuum multi arc ion plating technique can be applied to the area of magnesium alloy surface protection.