离子束辅助磁控溅射沉积铬-铜-氮薄膜的结构与性能
Structure and Properties of Cr-Cu-N Composite Films Prepared by Ion Beam Assisted Magnetron Sputtering
摘 要
应用低能离子束辅助磁控溅射(IBAMS)沉积铬-铜-氮薄膜,研究了铜含量和轰击能量对薄膜结构、硬度和断裂韧度的影响.结果表明:在相同的轰击能量(400eV)下,铜含量对薄膜结构和硬度的影响不明显,但是铜的加入有利于提高薄膜的断裂韧度;离子辅助轰击能量从400eV增加到800eV时薄膜的结构发生了显著变化,断裂韧度和硬度均大幅度提高.
铬-铜-氮薄膜
硬度
断裂韧度
ion beam assisted magnetron sputtering
Cr-Cu-N film
hardness
fracture toughness
Abstract
Cr-Cu-N films were deposited using low energy ion beam assisted magnetron sputtering (IBAMS).The effects of copper and bombardment energy on structure,hardness and fracture toughness of the films were studied.The added copper had no obvious effects on the film structure and hardness at same bombardment energy of 400eV.But added copper was beneficial to improvement of the film fracture toughness.When the ion bombardment energy was increased from 400eV to 800eV,the film structure was changed remarkably and its fracture toughness and hardness were improved further.
中图分类号 TG113.25
所属栏目
基金项目 国家自然科学基金资助项目(50371060)
收稿日期 2005/1/24
修改稿日期 2005/3/30
网络出版日期
作者单位点击查看
备注田林海(1969-),男,山西宁武人,博士研究生.
引用该论文: TIAN Lin-hai,ZONG Rui-lei,ZHU Xiao-dong,TANG Bin,HE Jia-wen. Structure and Properties of Cr-Cu-N Composite Films Prepared by Ion Beam Assisted Magnetron Sputtering[J]. Materials for mechancial engineering, 2006, 30(5): 30～32
田林海,宗瑞磊,朱晓东,唐宾,何家文. 离子束辅助磁控溅射沉积铬-铜-氮薄膜的结构与性能[J]. 机械工程材料, 2006, 30(5): 30～32
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参考文献
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【7】Leyland A,Matthews A.Design criteria for wear-resistant nanostructured and glassy-metal coatings[J].Surf Coat Technol,2004,177-178:317-324.
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【12】Mehrotra P K,Quinto D T.Techniques for evaluating mechanical properties of hard coatings[J].J Vac Sci Technol,1985,A3(6):2401-2405.
【13】Myung Hyun S,Lee Hyuk M,Shaginyan Leonid R,et al.Microstructure and mechanical properties of Cu doped TiN superhard nanocomposite coatings[J].Surf Coat Technol,2003,163-164:591-596.
【14】Espinoza-Beltrán F J,Che-Soberanis O,García-González L,et al.Effect of the substrate bias potential on crystalline grain size,intrinsic stress and hardness of vacuum arc evaporated TiN/c-Si coatings[J].Thin Solid Films,2003,437:170-175.
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