磁控溅射MoS2/Ni复合膜的制备及其摩擦性能
Preparation and Tribology Performance of Magnetron Sputtering MoS2/Ni Composite Films
摘 要
采用磁控溅射法制备了MoS2/Ni复合膜,同时对影响膜层性能的工艺参数进行了初步探讨,并对复合膜进行了成分与结构分析以及摩擦试验.结果表明:在本试验工艺参数(本底真空度为7.0×10-4 Pa,沉积气压为0.5 Pa,溅射功率为160 W,溅射氩气流量为80 cm3/s,靶基距为60 mm,基片温度为70 ℃)下制备的MoS2/Ni复合膜能够大大降低不锈钢等基底表面的摩擦因数,并且在高速重载的条件下具有更低的摩擦因数和更小的摩擦因数波动值.
MoS2/Ni复合膜
摩擦
magnetron sputtering
MoS2/Ni composite film
friction
Abstract
The depositon technology of magnetron sputtering MoS2/Ni composite films was introduced.Several factors that affected the properties of films were studied initially.Composite films were analyzed by means of EDS and XRD,and friction properties were tested,too.The deposition parameters of MoS2/Ni film were gained as follows:background vacuum 7.0×10-4 Pa,deposition air pressure 0.5 Pa,sputtering power 160 W,Ar sputtering flux 80 cm3/s,target cardinal distance 60 mm and substrate temperature 60 ℃.The friction coefficient and its fluctuation of the films were very low.The friction and wear properties of the films were improved under the conditions of heavy load and high speed.
中图分类号 O484.1 TG115.58
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收稿日期 2006/5/29
修改稿日期 2006/10/7
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备注姚固文(1982-),男,贵州遵义人,硕士研究生.
引用该论文: YAO Gu-wen,LI Chang-sheng,ZHANG Ye. Preparation and Tribology Performance of Magnetron Sputtering MoS2/Ni Composite Films[J]. Materials for mechancial engineering, 2007, 31(4): 52～54
姚固文,李长生,张晔. 磁控溅射MoS2/Ni复合膜的制备及其摩擦性能[J]. 机械工程材料, 2007, 31(4): 52～54
被引情况:
【1】苏达,郭立杰,熊艳艳,刘明芳, "Monel合金粒子注入对MoS2固体润滑膜形貌及性能的影响",机械工程材料 39, 77-80(2015)
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参考文献
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【5】陈煮,郭等柱,万志华,等.磁控溅射防锈MoS2薄膜沉积工艺研究[J].真空与低温,2002,8(4):241-245.
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【10】王海斗,刘家浚,徐滨士.复合镀渗MoS2薄膜及其组织性能分析[J].金属热处理,2004,29(4):29-32.
【2】Renevier N M,Oosterling H,Konig U,et al.Performance and limitations of MoS2/Ti composite coated inserts[J].Surface and Coatings Technology,2003,172:13-14.
【3】Carrera S,Salas O,Moore J J,et al.Performance of CrN/MoS2 (Ti) coatings for high wear lowfriction applications[J].Surface and Coatings Technology,2003,167:25-26.
【4】Renevier N M,Fox V C,Teer D G.Coating characteristics and tribological properties of sputter-deposited MoS2 metal composite coatings deposited by closed field unbalanced magnetron sputter ion plating[J].Surface and Coatings Technology,2000,127:24-37.
【5】陈煮,郭等柱,万志华,等.磁控溅射防锈MoS2薄膜沉积工艺研究[J].真空与低温,2002,8(4):241-245.
【6】王吉会,张爱平,夏杨.沉积条件对MoS2薄膜生长特性的影响[J].兵器材料科学与工程,2005,28(4):40-44.
【7】王培录,刘仲阳,廖小东,等.IBAD MoS2-Ta膜的电子显微与能谱分析[J].核技术,1999,22(3):143-148.
【8】Spalvins T.A review of recent advances in solid film lubrication[J].Journal of Vacuum Science & Technology,1987,A5(2):212-219.
【9】Fleischauer P D.Effect of crystallite orientation on environmental stability and lubrication properties of sputtered MoS2 thin film[J].ASLE Transactions,1989,27(1):82-88.
【10】王海斗,刘家浚,徐滨士.复合镀渗MoS2薄膜及其组织性能分析[J].金属热处理,2004,29(4):29-32.
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