X射线反射法测量铋系超导薄膜的结构参数
Structure Parameter of Bi Superconducting Thin Film Using X-Ray Reflectivity
摘 要
以铋系超导薄膜材料为例,应用X射线反射法测量薄膜材料的厚度以及粗糙度等结构参数，对测量方法的原理、衍射仪的调试和步骤等进行了详细的说明。这一方法为薄膜材料结构参数的测量提供了新途径。
薄膜
厚度
X-ray reflectivity
thin film
thickness
Abstract
The method to measure the thickness and toughness of Bi superconducting thin film by X-ray reflectivity was studied. The principle of measurement and the setting steps of X-ray diffractometer were detailed introduced. This is a new method to study the properties of thin film.
中图分类号 TG115.22
所属栏目 试验技术与方法
基金项目 沈阳市大型科学仪器网资助项目
收稿日期 2008/9/12
修改稿日期
网络出版日期
作者单位点击查看
备注贺 彤(1979-),女,助理研究员，博士。
引用该论文: HE Tong,SUN Wei,JIN Yu,QI Yang,PEI Jian-fen. Structure Parameter of Bi Superconducting Thin Film Using X-Ray Reflectivity[J]. Physical Testing and Chemical Analysis part A:Physical Testing, 2009, 45(6): 345～347
贺彤,孙伟,金禹,祁阳,裴剑芬. X射线反射法测量铋系超导薄膜的结构参数[J]. 理化检验－物理分册, 2009, 45(6): 345～347
被引情况:
【1】徐光亮,赵德友,刘桂香, "X射线反射法分析ZnO基薄膜的厚度、密度和表面粗糙度",理化检验－物理分册 46, 757-760(2010)
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参考文献
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【3】丛秋滋. 多晶二维X-射线衍射[M]. 北京：科学出版社,1997．
【4】KING J S,WHANG W Z,LEE W C,et al. Effect of backbone on the biaxial retardation of polyimide films in uniaxial stretch[J]. Materials Chemistry and Physics,2007(103): 35-40．
【5】王力衡,黄运添,郑海涛. 薄膜技术[M]. 北京：清华大学出版社,1991:15-54．
【6】JAKOPIC G,PAPOUSEK W. Unified analytical inversion of reflectometric and ellipsometric data of absorbing media[J]. Applied Optics,2000,39(16): 2727-2732．
【7】PARRATT L G. Surface studies of solid by total reflection of X-rays [J]. Phys Rev,1954(95): 359-366．
【8】BHATTACHARYYA D,DAS N C,ROY A P,et al. Structure dielectric and optical properties of Bi1.5ZnNb1.5-xTaxO7 cubic pyrochlores[J]. Journal of Applied Optics,1999,28:1-6．
【9】HAGGE T,ZEGENHAGEN J,HABERMEIER H U,et al. Nucleation mechanism of YBa2Cu3O7-d on SrTiO3(001) [J]. Phys Rev Lett,1998(80): 4225-4229．
【10】KAZUO N. Thickness composition diagrams of Stranski-Krastanov mode in the GapSb Gap and In-GaAs/GaAs systems[J]. Journal of Crystal Growth,1999(203): 376-386．
【11】LORENZ W J,STAIKOV G. 2D and 3D thin film formation and grow the mechanisms in metal electrocrystallization- an atomistic view by in situ STM [J]. Surface Science,1995(335): 32-43．
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